Small-dosage organic material purification method and equipment

Abstract

The invention relates to a small-dosage organic material purification method and equipment. The purification method provided by the invention comprises the following steps: putting an organic source material to be purified into an evaporation source and mounting the evaporation source above a collection chamber; arranging a sample collection platform in the collection chamber and just below an outlet of the evaporation source; a baffle plate in the collection chamber is adjusted to be located between the outlet of the evaporation source and the sample collection platform; adjusting the vacuumdegree in the collection chamber to be no more than 10<-9>Pa; heating an organic source material in the evaporation source and controlling the heating temperature to be lower than the evaporation/sublimation temperature of a target molecule; adjusting the position of the baffle plate to align the outlet of the evaporation source to be aligned to the sample collection platform; controlling the heating temperature of the organic source material in the evaporation source to be not lower than the evaporation/sublimation temperature of the target molecule; collecting a purified organic source material on the sample collection platform. With the adoption of the purification method, efficient purification of the small-dosage organic source material with the mass less than 5g can be realized.

Description

technical field [0001] The invention relates to the technical field of organic material purification, in particular to a small-dose organic material purification method and purification equipment. Background technique [0002] In the field of organic semiconductors, the purity of organic materials has a crucial impact on the performance of semiconductor devices. In order to obtain high-performance semiconductor devices, high-purity organic materials must first be obtained. Currently on the market, there are many methods for purifying organic materials: such as zone melting method, recrystallization method, multi-temperature zone vacuum sublimation method, etc. However, these methods are only suitable for the purification of large doses of source materials, and the waste rate is extremely high, and it is difficult to realize the purification of small doses of source materials. [0003] Multi-temperature zone vacuum sublimation method is a more commonly used purification met...

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Problems solved by technology

[0004] The multi-temperature zone vacuum sublimation method is simple to operate, but there are also obvious disadvantages: 1. Based on the characteristics of the multi-temperature zone in its equipment structure: the sample molecules diffuse from left to right, and the sample collection surface is a circular cylinder, which is not conducive to sample molecules. and the surface area of ​​the collection area is large, and the collection rate of the material adhering to the surface of the collection area is very low, which makes it impossible to purify small doses of source materials; 2. When the first purification fails to meet the purity requirements, the product will Carry out the second or more purifications, making the whole purification process time-consuming and consumable

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