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Alignment lens for laser direct imaging lithography

A laser direct imaging and lens technology, applied in the field of alignment lens, can solve the problem that the production cycle is difficult to meet the demand in terms of cost, achieve high resolution, and solve the effect of alignment problems

Active Publication Date: 2018-11-23
ANHUI UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The mask plate is the master plate of lithography, which needs to be provided by a professional supplier, and loss and design changes will inevitably occur in lithography production, so the traditional masked lithography has no cost or production cycle. Difficult to meet the needs

Method used

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  • Alignment lens for laser direct imaging lithography
  • Alignment lens for laser direct imaging lithography
  • Alignment lens for laser direct imaging lithography

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Embodiment Construction

[0028] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0029] The invention provides an alignment lens for laser direct imaging lithography, comprising:

[0030] The first lens 10, the second lens 20, the third lens 30, the fourth lens 40 and the fifth lens 50 arranged in sequence from the object plane 110 to the image plane 120; the third lens 30 and the fourth lens 40 are arranged between with aper...

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Abstract

The invention provides an alignment lens for laser direct imaging lithography. The alignment lens comprises a first lens, a second lens, a third lens, a fourth lens and a fifth lens which are arrangedsequentially from an object surface to an image surface; a diaphragm is disposed between the third lens and the fourth lens; a distance from the object surface to the object surface of the first lensis 97.5 mm; the object surface of the first lens is a convex surface; the radius of curvature of the object surface of the first lens is 51.988 mm; the image surface of the first lens is a convex surface; the radius of curvature of the image surface of the first lens is -107.583 mm; and the center thickness of the first lens is 10 mm. According to the alignment lens of the invention, the five lenses are reasonably set, so that the long-focal depth, high-resolution and low-distortion alignment lens can be realized with a small number of lenses. The alignment lens can be applied to the lithography of boards of various thicknesses. With the alignment lens adopted, the alignment problem of a direct imaging lithography system can be solved.

Description

technical field [0001] The invention relates to the technical field of optical imaging, in particular to an alignment lens for laser direct imaging lithography. Background technique [0002] Photolithography is a typical process in the semiconductor industry. It is a process of transferring the feature pattern on the mask plate to the silicon wafer through exposure. According to different mask forms, lithography can be divided into mask lithography and maskless lithography. The mask plate is the master plate of lithography, which needs to be provided by a professional supplier, and loss and design changes will inevitably occur in lithography production, so the traditional masked lithography has no cost or production cycle. Difficult to meet demand. The laser direct imaging lithography system uses a spatial light modulator (to replace the reticle. The lithographic projection lens projects the image of the spatial light modulator onto the mask, and after exposure and develop...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B13/00G02B13/22G03F7/20
CPCG02B13/0015G02B13/22G03F7/7015G03F7/70258
Inventor 周胜李劲松张磊俞本立
Owner ANHUI UNIVERSITY
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