Infrared optical material impurity test method

Abstract

The invention relates to an infrared optical material impurity testing method, and relates to the technical field of optical material impurity testing. According to the method, based on the depth field characteristic and the scene imaging principle of an infrared photographing system, the condition of the impurities in the infrared material which is not transparent to the visible light is subjected to primary imaging of the depth field range of the infrared photographing system to obtain all the impurity conditions inside the infrared optical material; the method for testing the impurities inside the infrared material which is not transparent in visible light is simple in equipment requirement, and a precise platform for carrying out two-dimensional automatic movement of a sample and a precise one-dimensional automatic moving platform for carrying a microscope objective lens are not needed, so that the cost of the testing equipment is lowered; the test method is carried out by real imaging through one time of camera shooting, without processing of an overlapped imaging result, so that the reflected test result is true; and the testing method can be completed by one time of camera shooting, so that the test is quick and convenient and short in time.

Description

technical field [0001] The invention relates to the technical field of optical material impurity testing, in particular to an infrared optical material impurity testing method. Background technique [0002] Impurities in optical materials are non-uniform material defects such as air bubbles and stones left after the manufacture of optical materials. These non-uniform material defects will seriously affect the imaging quality of the optical system. Testing the impurities in optical materials is a necessary link to evaluate whether optical materials can meet the requirements of use. For optical materials in the visible band, the impurities in the material are irradiated by a diffuse reflection light source, and the number and size of impurities are recorded by direct observation with a magnifying glass, and then brought into the formula to calculate and evaluate the level of impurities in optical materials. [0003] For infrared optical materials (wavelength 0.8 μm ~ 14 μm) t...

AI Technical Summary

Problems solved by technology

[0007] The technical problem to be solved by the present invention is: how to design a testing principle and method for impurities in infrared optical materials, so as to solve the actual testable problems of impurities in optical materials, reduce the complexity of the composition of the testing device and the testing process, and obtain materials that meet the requirements of impurities in materials. Real-world results, lower test costs, shorter test times

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