A method and apparatus for simulating a metal mask
A metal mask and simulation method technology, applied in the field of metal mask simulation methods and devices, can solve the problems of increasing design cost and increasing development cycle, and achieve the effect of saving design cost and shortening the development cycle
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0044] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention. It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined arbitrarily with each other.
[0045] At present, the production of metal masks usually adopts the wet etching method that can be stably mass-produced, and the openings formed by the wet etching process have a trapezoidal opening cross-section, and the thickness and shape of the opening cross-section are not uniform. . Wherein, the cross-section of the opening refers to a plane parallel to the axis of the opening. image 3 is a schematic diagram of the opening on the surface of the metal mask contacting the substrate, Figure 4 I...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com