OPC correction method for sram layout
A technology of layout and repeating unit, which is applied in the photoengraving process of pattern surface, originals and instruments for opto-mechanical processing, etc. It can solve the problems of long time, inappropriate layout calculation, and complexity.
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no. 1 example
[0037] Such as Figure 5 As shown, the present invention provides the first embodiment of the OPC correction method of the SRAM layout, comprising the following steps:
[0038] 1) Divide the SRAM layout into a middle area, a transition area and a border area;
[0039] The middle area, the area of repeating cell layout in the SRAM layout;
[0040] The transition area, extending from the boundary of the middle area to the center of the middle area with a preset width, wherein the preset width is greater than 5 to 10 areas of the smallest repeating unit size;
[0041] That is, the predetermined width is greater than 5, 6, 7, 8, 9 or 10 minimum repeating unit sizes. This example extends a distance of 5 minimum repeat unit sizes.
[0042] Boundary area, the remaining area after removing the middle area and transition area in the SRAM layout;
[0043] 2) Perform pxOPC correction on the screenshot of the repeating unit in the SRAM layout to obtain the minimum repeating unit mas...
no. 2 example
[0048] The present invention provides the second embodiment of the OPC correction method of SRAM layout, comprising the following steps:
[0049] 1) Divide the SRAM layout into a middle area, a transition area and a border area;
[0050] The middle area, the area where the smallest repeating unit is laid out in the SRAM layout;
[0051] The transition area, extending from the boundary of the middle area to the center of the middle area with a preset width, wherein the preset width is greater than 5 to 10 areas of the smallest repeating unit size;
[0052] That is, the predetermined width is greater than 5, 6, 7, 8, 9 or 10 minimum repeating unit sizes. This example extends a distance of 10 minimum repeat unit sizes.
[0053] Boundary area, the remaining area after removing the middle area and transition area in the SRAM layout;
[0054] 2) A part of the screenshot containing the repeating unit in the SRAM layout is intercepted for pxOPC correction, and the mask template of th...
no. 3 example
[0060] The present invention provides the third embodiment of the OPC correction method of SRAM layout, comprising the following steps:
[0061] 1) Divide the SRAM layout into a middle area, a transition area and a border area;
[0062] The middle area, the area where the smallest repeating unit is laid out in the SRAM layout;
[0063] The transition area, extending from the boundary of the middle area to the center of the middle area with a preset width, wherein the preset width is greater than 5 to 10 areas of the smallest repeating unit size;
[0064] That is, the predetermined width is greater than 5, 6, 7, 8, 9 or 10 minimum repeating unit sizes. This example extends a distance of 15 minimum repeat unit sizes.
[0065] Boundary area, the remaining area after removing the middle area and transition area in the SRAM layout;
[0066] 2) Take a screenshot of a part of the middle area of the SRAM layout and perform pxOPC correction to obtain the mask of the smallest repea...
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