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A post-processing method for improving the photoelectric properties of transparent conductive films
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A technology with transparent conductive film and photoelectric performance, which is applied in the manufacture of circuits, electrical components, cables/conductors, etc., to achieve good industrial application prospects, low cost and energy consumption, and simple operation
Active Publication Date: 2020-05-15
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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[0003] At present, the post-treatment methods commonly used to improve the photoelectric properties of transparent conductive films include: heating or mechanical pressure, vacuum filtration cleaning or compounding with other conductive materials, etc., but these methods are only applicable to transparent conductive films of certain materials and substrates
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Embodiment 1
[0026] Such as figure 1 As shown, the post-treatment process of improving the photoelectric properties of the transparent conductive film in this embodiment specifically includes the following steps:
[0027] In step A, a transparent conductive film is prepared, and the specific steps include:
[0028] A1, clean the high-temperature-resistant polyester film (PET film) with acetone and absolute ethanol successively in the ultrasonic state, wash with acetone and absolute ethanol for 30 minutes respectively, and dry naturally to obtain a PET film with a clean surface;
[0029] A2, the surface of the clean PET film is modified to make the surface of the material positively charged in the solution. The process is: the PET film is irradiated with ultraviolet rays, and the surface is grafted with methacryloyloxyethyl-propyl-dimethyl bromideAmmonium;
[0030] A3, prepare metalnanowire dispersion liquid containing anionic surfactant, so that the surface of nanowire is negatively ch...
Embodiment 2
[0037] Such as figure 1 As shown, the post-treatment process of improving the photoelectric properties of the transparent conductive film in this embodiment specifically includes the following steps:
[0038] In step A, a transparent conductive film is prepared, and the specific steps include:
[0039] A1, clean the PET film with acetone for 20 minutes in the ultrasonic state, take it out and rinse the surface of the PET film with deionized water;
[0040] A2, cleaning the PET film obtained in step A1 with ethanol for 20 minutes in an ultrasonic state, and drying A1 naturally, cleaning the PET film with acetone and absolute ethanol in sequence for 20 minutes in an ultrasonic state, and drying naturally to obtain a PET film with a clean surface;
[0041] A2, the surface of the PET film with a clean surface is modified to make the surface of the material positively charged in the solution. The process is: the PET film is irradiated with ultraviolet rays, and the surface is graf...
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Abstract
The invention relates to the technical field of transparent conductive thin films, in particular to a post-processing method for improving the photoelectric property of transparent conductive thin films. The method includes the following steps: first a transparent conductive film is prepared; The transparent conductive film is put into a precision ionetching instrument and the current and voltageof the equipment are adjusted to an appropriate value; The photoelectric property of the film is improved by ion beam flushing to remove a non-conductive layer adsorbed on the film surface. By adoption of the transparent conductive film processed by the invention, the photoelectric property of the film can be greatly improved, the method has the beneficial effects of simple operation, low cost and energy consumption, no pollution to the ecological environment, and no damage to the film material and the substrate. It is suitable for treating any kind of transparent conductive film and can be used in conjunction with the traditional post-treatment to further improve the photoelectric property of the transparent conductive film, and has good application prospects.
Description
technical field [0001] The invention relates to the technical field of transparent conductive films, in particular to a post-treatment method for improving the photoelectric properties of transparent conductive films. Background technique [0002] With the development of science and technology, more and more people pay attention to optoelectronic devices. As an important part of optoelectronic devices, transparent conductive films have a bright prospect in industrial production. In order to obtain transparent conductive films with excellent properties, some post-processing methods have been proposed by researchers. [0003] At present, the post-treatment methods commonly used to improve the photoelectric properties of transparent conductive films include: heating or mechanical pressure, vacuum filtration cleaning or compounding with other conductive materials, etc., but these methods are only applicable to transparent conductive films of certain materials and substrates. C...
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Patent Type & Authority Patents(China)
IPC IPC(8): H01B13/00
CPCH01B13/00
Inventor 祝清省郑博达
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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