Surface-enhanced Raman substrate and preparation method thereof

A surface-enhanced Raman and substrate technology, applied in Raman scattering, ion implantation plating, coating, etc., can solve the problems of limiting the application of SERS substrate detection, affecting the SERS enhancement ability, and weak local electromagnetic field enhancement effect. Strong local electromagnetic field enhancement effect, ultra-high signal enhancement ability, and sensitivity enhancement effect

Active Publication Date: 2019-01-04
UNIV OF SCI & TECH BEIJING
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Problems solved by technology

This technology uses precious metals such as gold and silver to prepare SERS substrates with high activity, but the low melting point of noble metal nanostructures limits the detection application of SERS substrates under high temperature conditions; at the same time, the material, structure, size, etc. of the substrate will be significantly Therefore, it is necessary to rationally design the morphology and structure of the substrate to improve the SERS activity.
[0003] It has been reported that silver nanorod arrays were prepared as SERS substrates by using th

Method used

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  • Surface-enhanced Raman substrate and preparation method thereof

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[0024] Another object of the present invention is to provide a method for preparing the above-mentioned surface-enhanced Raman substrate, which specifically includes the following steps:

[0025] Using the oblique growth method of electron beam deposition, an ultra-thin oxide layer is deposited on the top of the silver nanorod array; then silver nanoparticles are deposited on the top of the oxide layer to obtain a silver nanorod-oxide-silver particle composite structure as Surface-enhanced Raman substrates.

[0026] The method of preparing an ultra-thin oxide layer by using the oblique growth method is as follows: using a high-melting point oxide as a target material, adjusting the incident angle of the electron beam to 80-88°, and keeping the sample stage stationary, depositing a thickness of 5~20 nm oxide layer.

[0027] The method of preparing silver nanoparticles by using the inclined growth method is as follows: convert the evaporation material to metallic silver, adjust...

Embodiment 1

[0032] 1. Clean the glass substrate sequentially with acetone, alcohol and deionized water and dry it;

[0033] 2. Fix the cleaned substrate on the sample stage of the electron beam evaporation coating machine, and pump the chamber of the electron beam evaporation coating machine to 10 －5 High vacuum below Pa;

[0034] 3. Deposit a 600nm-long silver nanorod array film on the substrate;

[0035] 4. Convert the evaporation material to aluminum oxide, adjust the incident angle of the electron beam to 82°, and make the sample stage static, and deposit an aluminum oxide layer with a thickness of 8 nm on the top of the silver nanorod array;

[0036] 5. Convert the evaporation material to silver metal, the incident angle of the electron beam is 82°, and make the sample stage static, and deposit silver nanoparticles with a thickness of 50 nm on the top of the aluminum oxide layer;

[0037] 6. Heat the silver nanorod-alumina-silver particle substrate prepared in steps 1-5 and the sil...

Embodiment 2

[0040] 1. Clean the glass substrate sequentially with acetone, alcohol and deionized water and dry it;

[0041] 2. Fix the cleaned substrate on the sample stage of the electron beam evaporation coating machine, and pump the chamber of the electron beam evaporation coating machine to 10 －5 High vacuum below Pa;

[0042] 3. Deposit 800 nm-long silver nanorod array film on the substrate of the sample stage;

[0043] 4. Convert the evaporation material to aluminum oxide, adjust the incident angle of the electron beam to 85°, and make the sample stage static, and deposit an aluminum oxide layer with a thickness of 12 nm on the top of the silver nanorod array;

[0044] 5. Convert the evaporation material to metallic silver, the incident angle of the electron beam is 85°, and make the sample stage static, and deposit silver nanoparticles with a thickness of 150 nm on the top of the aluminum oxide layer;

[0045] 6. Configure 10 -6 mol / L methylene blue solution;

[0046] 7. Put the...

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Abstract

The invention belongs to the technical field of detection of trace organics and discloses a surface-enhanced Raman substrate and a preparation method thereof. The preparation method employing obliquegrowth comprises: depositing an oxide layer at the top end of a silver nanorod array; depositing silver nano particles at the top end of the oxide layer to obtain silver nanorod-oxide-silver particlecomposite serving as the surface-enhanced Raman substrate. The surface-enhanced Raman substrate prepared via the preparation method gains improved thermal stability owing to high melting point of theoxide layer and protection for silver nanorods; the silver nanorods and the silver nano particles are isolated via the oxide layer which is ultra-thin, strong local electromagnetic field enhancement is provided at a gap, and therefore, sensitivity of the substrate herein is greatly improved. The substrate herein is applicable to detection at high temperatures, has great signal-enhancing capacity,provides a widened applicable range for surface enhanced Raman technology, and has great development potential.

Description

technical field [0001] The invention belongs to the technical field of trace organic matter detection, in particular to a surface-enhanced Raman substrate and a preparation method thereof. Background technique [0002] Surface-enhanced Raman scattering (SERS) technology has the advantages of fingerprint recognition, high sensitivity, simplicity, good selectivity and non-destructive testing. This technology has great advantages in the detection of trace substances. In recent years, the surface-enhanced Raman effect has been widely used in environmental detection, food safety, medical diagnosis and surface science and other fields. This technology uses precious metals such as gold and silver to prepare SERS substrates with high activity, but the low melting point of noble metal nanostructures limits the detection application of SERS substrates under high temperature conditions; at the same time, the material, structure, size, etc. of the substrate will be significantly Theref...

Claims

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Application Information

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IPC IPC(8): C23C14/30C23C14/08C23C14/18G01N21/65
CPCC23C14/08C23C14/18C23C14/225C23C14/30G01N21/658
Inventor 马菱薇张政军
Owner UNIV OF SCI & TECH BEIJING
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