A dual-mesa direct writing type exposure machine and an exposure method thereof
A technology of direct writing and exposure machine, which is applied in the direction of photomechanical equipment, microlithography exposure equipment, photolithography exposure device, etc., which can solve the problems of long production cycle, long process time, low production capacity, etc., and save site space , increase production capacity, improve the effect of utilization efficiency
Pending Publication Date: 2019-01-04
SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD
View PDF0 Cites 2 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
The existing single-table exposure machine has a low production capacity and a long production cycle. The exposure of each substrate needs to complete the processes of loading, alignment, exposure, and unloading, and the entire process takes a long time
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0024] See Figure 1 to Figure 3 , a dual-table direct-writing exposure machine of the present invention includes a base 1 and an alignment mechanism 2 and an exposure mechanism 3 arranged on the base through a gantry mechanism in sequence. In this embodiment, the base adopts a marble base, and the base 1 There are two stepping axis motion assemblies 4 arranged parallel to each other on the top, and Z-axis motion assemblies 5 are respectively installed on the stepping axis motion assemblies 4. The stepping axis motion assembly 4 can drive the Z-axis motion assembly 5 to move back and forth through the alignment Mechanism 2, exposure mechanism 3, and Z-axis motion components 5 are respectively fixedly connected to the substrate carrying table 6. The substrate carrying table 6 is set up and down to form two layers, and the Z-axis motion component 4 can drive the substrate carrying table 6 to move up and down to make the exposure focus Face alignment, in this embodiment, the subs...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
A dual-mesa direct-writing type exposure machine is disclosed so that that utilization rate of the equipment is improve, which reduces idle time of each system of the equipment, so as to effectively improve the production capacity of the exposure machine, comprises a base and an alignment mechanism sequentially arranged on the base through a gantry mechanism, exposure mechanism, two stepping shaftmoving assemblies arranged in parallel with each other are arranged on the base, A Z-axis movement assembly is respectively arrange on that movement assembly of the stepping shaft, A Z-axis movementcomponent can be driven to move forward and backward through that alignment mechanism by the step shaft movement component, exposure mechanism, The Z-axis moving assembly is fixedly connected with thesubstrate bearing table surface, the substrate bearing table surface is provided with a suction cup, the substrate bearing table surface is arranged in two layers, and the Z-axis moving assembly candrive the substrate bearing table surface to move up and down so as to align the exposure focus. In addition, the invention also provides an exposure method of a double-table direct-writing exposure machine.
Description
technical field [0001] The invention relates to the technical field of laser direct-writing exposure machines, in particular to a double-table direct-writing exposure machine and an exposure method thereof. Background technique [0002] Laser direct writing exposure is used to print a characteristic composition on the surface of the substrate. Compared with the traditional image direct transfer technology exposed by mask plates and film negatives, the direct writing exposure technology has high productivity and high alignment accuracy. . It plays a very important role in the field of semiconductor and PCB production. [0003] At present, the direct writing exposure in the market is mainly based on single-table exposure machines. The existing single-table exposure machine has a low production capacity and a long production cycle. The exposure of each substrate needs to complete the processes of loading, aligning, exposing, and unloading, and the entire process takes a long ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More IPC IPC(8): G03F7/20
CPCG03F7/2022G03F7/2053G03F7/70383G03F7/70733
Inventor 不公告发明人
Owner SUZHOU YUANZHUO OPTOELECTRONICS TECH CO LTD