Silicon carbide schottky diode for optimizing heat distribution and method of manufacturing the same
A technology of Schottky diode and manufacturing method, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of high temperature, lower rated current of devices, uneven current distribution, etc., to achieve uniform heat distribution, suppression of The effect of current concentration and optimized heat distribution
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[0041] The first embodiment is as figure 1 As shown, it specifically includes the following steps:
[0042] S310: Form a current suppression region 8 in the middle of the upper surface of the N-type epitaxial layer 3, and inject P-type impurities into the upper surface of the N-type epitaxial layer 3 at the position of the current suppression region 8, thereby forming a strip-shaped second P Type well regions 5 and strip-shaped second N-type well regions 6, the second P-type well regions 5 and the second N-type well regions 6 are alternately distributed in the N-type epitaxial layer 3;
[0043] S320: Implanting P-type impurities on the upper surface of the N-type epitaxial layer 3 around the current suppression region 8, thereby forming a strip-shaped first P-type well region 4 and a strip-shaped first N-type well region 9, the first The P-type well regions 4 and the first N-type well regions 9 are distributed alternately at intervals around the current suppression region 8, ...
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