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Pulsed DC power supply

A power supply, pulsed DC technology, applied in the field of deposition systems, can solve problems such as short turn-on time, influence of deposition rate of sputter deposition process, etc.

Inactive Publication Date: 2019-01-18
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the operator is not experienced enough to properly set these process parameters, or if the sputtering process behaves in unexpected ways, or simply changes over time, multiple arcs may form which need to be suppressed by arc suppression circuits The formation of arcs, or too short an on-time during which sputtering occurs, will negatively affect the deposition rate of the sputter deposition process

Method used

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  • Pulsed DC power supply
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Embodiment Construction

[0019] Reference now will be made in detail to various exemplary embodiments, one or more examples of which are depicted in the various drawings. Each example is provided only by way of explanation of the present invention, not intended to limit the present invention. For example, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield yet a further embodiment. The present disclosure is intended to cover such modifications and variations.

[0020] In the following description of the drawings, the same reference numerals denote the same or similar components. In general, only differences with respect to individual implementations are described. The structures shown in the drawings are not necessarily drawn in actual scale or angle, and features may be exaggerated for better understanding of corresponding embodiments.

[0021] figure 1 The characteristics of a unipolar pulsed DC voltage that can be applied ...

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Abstract

A pulsed DC power supply is provided. The pulsed DC power supply is configured for providing unipolar pulsed DC power. The pulsed DC power supply includes a pulsing unit for alternatingly setting a nominal on-cycle DC voltage during on-cycles and a nominal off-cycle voltage during off-cycles of unipolar pulse cycles of the pulsed DC power supply. The pulsed DC power supply includes a current measurement unit configured to measure an off-cycle current during an off-cycle, and a zero-line determination unit configured to determine a presence of a zero-line condition of the measured off-cycle current. The pulsing unit is configured to set the nominal on-cycle DC voltage upon determination of the presence of the zero-line condition of the measured off-cycle current.

Description

technical field [0001] Embodiments relate to a pulsed DC power supply for providing unipolar pulsed DC power and a method of operating such a pulsed DC power supply. Other embodiments relate to a deposition system (eg, a sputter deposition system) including such a pulsed DC power supply. Background technique [0002] Pulsed direct current (DC) sputtering is a physical vapor deposition process (PVD process) applied, for example, in the semiconductor and coating industries. The abbreviation "DC" stands for direct current, as opposed to alternating current. Pulsed DC sputtering is particularly effective for the sputtering of metal and dielectric coatings, and is often used in conjunction with reactive sputtering (where a chemical reaction takes place in a plasma between evaporated target material and an ionized gas such as oxygen). react to form deposition molecules (such as silicon oxides)). In conventional DC sputtering (eg reactive sputtering in aluminum, titanium or sili...

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Application Information

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IPC IPC(8): H01J37/34H01J37/32
CPCC23C14/3485C23C14/54H01J37/32935H01J37/32944H01J37/3444H01J37/3467
Inventor 尤韦·赫尔曼斯
Owner APPLIED MATERIALS INC
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