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A cleaning platform and cleaning method

A technology for cleaning platforms and cleaning fluids, applied in the field of cleaning, can solve problems such as corrosion spots on metal film layers, and achieve the effect of ensuring the cleaning effect

Active Publication Date: 2020-10-13
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The invention provides a cleaning platform and a cleaning method to solve the technical problem of corrosion spots formed on the front of the metal film layer where the existing cleaning process uses EUV and chemical liquid at the same time

Method used

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  • A cleaning platform and cleaning method
  • A cleaning platform and cleaning method
  • A cleaning platform and cleaning method

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Embodiment Construction

[0045] The following descriptions of the various embodiments refer to the accompanying drawings to illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [top], [bottom], [front], [back], [left], [right], [inside], [outside], [side], etc., are only for reference The orientation of the attached schema. Therefore, the directional terms used are used to illustrate and understand the present invention, but not to limit the present invention. In the figures, structurally similar elements are denoted by the same reference numerals.

[0046] The present invention aims at the technical problem of corrosion spots formed on the front side of the metal film layer where EUV and chemical solutions are used simultaneously in the existing cleaning process; this embodiment can solve this defect.

[0047] Such as figure 1 As shown, the cleaning platform provided by the present invention includes a substrate ...

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Abstract

The invention provides a cleaning platform and a cleaning method. After removing the organic particles on the surface of the substrate, the metal ions formed during the removal of the organic particles are also cleaned. After cleaning the metal ions, the metal ions enter the chemical liquid unit to remove the metal ions on the surface of the metal film. Non-neutral substances; since the metal ions on the surface of the metal film are cleaned before entering the liquid medicine unit, these metal ions cannot chemically form corrosion spots with the liquid medicine. That is, the embodiment of the present invention introduces a metal ion cleaning unit and This step retains the removal of organic particles and the chemical liquid. While ensuring the cleaning effect, corrosion spots will not be formed on the front of the metal film layer. This solves the problem of corrosion on the front of the metal film layer when EUV and chemical liquid are used at the same time in the existing cleaning process. Spot technical issues.

Description

technical field [0001] The invention relates to the cleaning field, in particular to a cleaning platform and a cleaning method. Background technique [0002] In industries such as flat panel display, the array process mainly includes film formation, photolithography and etching; film formation is to deposit metal on the glass substrate to form a metal film layer of a certain thickness; photolithography is to transfer the graphics on the mask On the metal film layer of the glass substrate, the pattern is composed of photoresist; the final etching process etches away the part not covered by the photoresist pattern, and then passes through the photoresist stripping unit to leave the corresponding metal pattern. [0003] Among them, the yellow light process includes cleaning, dehydration and drying, coating, pre-baking, exposure, development and post-baking processes. The cleaning platform corresponding to the cleaning process includes: EUV (ultraviolet) irradiation unit, liqui...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/08B08B1/02B08B3/02B08B5/02B08B7/00B08B13/00B08B1/20
CPCB08B3/022B08B3/08B08B5/023B08B7/0057B08B13/00B08B1/20B08B1/12
Inventor 涂乐志
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD