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A multi-valley transmission element and its preparation method

A transmission element and low refractive index technology, applied in the field of optical filter elements, can solve the problems of not being suitable for large-scale mass production and achieve the effect of cost reduction

Active Publication Date: 2021-02-26
HANGZHOU DENGZHITA TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] At present, the structure and preparation method of the above-mentioned precision multi-valley transmissive thin film element are not suitable for large-scale mass production and flexible substrate production, so there is an urgent need for a multi-valley transmissive element with simple structure, preparation method and low production cost

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  • A multi-valley transmission element and its preparation method
  • A multi-valley transmission element and its preparation method
  • A multi-valley transmission element and its preparation method

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preparation example Construction

[0052]The preparation method of the multi-grain transmission element of the present invention includes the following steps:

[0053](1) Set the center wavelength and transmittance target of the target filter band (can be determined according to the customer's customized parameters, or can be determined according to a large number of experiments), and the base material and the base material can be selected according to the center wavelength of the target filter band. Low refractive index material and set the thickness of the low refractive index material layer; According to the transmittance target, select the high refractive index material and set the thickness of the high refractive index material layer;

[0054]Through software simulation, parameters such as base material, high refractive index material, low refractive index material and their thickness are obtained;

[0055](2) The substrate is placed on a continuous coating production line; the high-refractive index material layer and th...

Embodiment 1

[0057]The target spectrum is: 420nm~450nm band (harmful blue light band) transmittance ≤80%; 565nm~595nm band (harmful blue complementary color yellow band) transmittance ≤85%; 460nm~555nm band (remaining blue and green light) Wave band) transmittance≥90%; 605nm~700nm waveband (red light band) transmittance≥90%, the color coordinates of the overall transmission spectrum are in the range of (0.333±0.008, 0.333±0.008).

[0058]The substrate is K9 glass, the high refractive index material is titanium dioxide (thickness 20nm), and the low refractive index material is silicon dioxide (thickness 615nm).

[0059]Fromimage 3 It can be seen that the multi-valley transmission element of this embodiment has a double-valley transmission spectrum in the visible light band, and the double-valleys are in the harmful blue wavelength band (420nm~450nm) and its color compensation band (565nm~595nm). The transmittance is 76%, and the transmittance in the 565nm~595nm band is 83%. The transmission element can...

Embodiment 2

[0061]The substrate is K9 glass, the high refractive index material is titanium dioxide (thickness 70nm), and the low refractive index material is silicon dioxide (thickness 790nm).

[0062]FromFigure 4 It can be seen that the multi-valley transmission element of this embodiment has a double-valley transmission spectrum in the visible light waveband, and the double-valley is in the glare-causing waveband (575nm~595nm) and its color compensation band (455nm~480nm), 575nm~595nm waveband. The transmittance is 70%, and the transmittance in the 455nm-480nm band is 73%, which achieves effective glare blocking and high-fidelity color.

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Abstract

The invention discloses a multi-valley transmission element, which comprises a substrate, on which a dielectric layer with several characteristics of selective transmission attenuation bands is deposited; the dielectric layer consists of a high refractive index material layer and a The low-refractive-index material layer consists of two thin films; the difference in refractive index between the substrate and the low-refractive-index material is less than or equal to 0.2. The multi-valley transmission element of the present invention only has two dielectric layers on the substrate, and can have multiple selective transmission attenuation bands. It has a simple structure and is suitable for large-scale batch production, thereby greatly reducing the cost of the multi-valley transmission element. It can be applied to more civil occasions.

Description

Technical field[0001]The invention relates to an optical filter element, in particular to a multi-valley transmission element and a preparation method thereof.Background technique[0002]The multi-valley transmission element has multiple selective transmission attenuation band characteristics. The precision multi-valley transmission thin film element realizes the multi-valley transmission spectrum through dozens of layers of alternating high and low refractive index film stacks, which requires complicated and precise control of film thickness, long coating cycle, high production cost, and is not suitable for making flexible elements . Existing precision multi-grain transmission thin film components are only suitable for high-precision instruments and equipment, and are not suitable for civilian consumer products such as glasses, electronic product films, and automobile glass.[0003]Multi-valley transmission elements have a wide range of uses, and are most commonly used in technical fie...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/28
CPCG02B5/28G02B5/285
Inventor 杨陈楹沈伟东
Owner HANGZHOU DENGZHITA TECH CO LTD