Nano epoxy coating and preparation method thereof
A technology of epoxy nano- and nano-coating, which is applied to coatings, devices for coating liquid on surfaces, and pre-treated surfaces, etc., which can solve electronic signal attenuation, abnormal use, and poor heat dissipation and electrical conductivity of the substrate and other problems to achieve the effect of avoiding damage, improving bonding force, and avoiding heat dissipation difficulties
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Embodiment 1
[0030] A kind of epoxy nano-coating and preparation method thereof, through following steps:
[0031] (1) Place the iron block in the 200L plasma vacuum reaction chamber, and continuously evacuate the reaction chamber to make the vacuum degree reach 0.8 millitorr.
[0032] (2) Introduce helium gas with a flow rate of 50 sccm, turn on the radio frequency plasma discharge to pretreat the iron substrate (that is, turn on the radio frequency pretreatment plasma discharge), the discharge power in the pretreatment stage is 20W, and the discharge lasts for 100s .
[0033] (3) The nano-coating was prepared by chemical vapor deposition on the surface of the substrate by introducing monomer S1. The flow rate of the monomer was 150 μL / min. The plasma discharge for pretreatment was adjusted to the plasma discharge for deposition. In this deposition stage, the plasma in the cavity is generated by radio frequency discharge, the output mode is pulse, the pulse width is 5μs, the repetition ...
Embodiment 2
[0039] A kind of epoxy nano-coating and preparation method thereof, through following steps:
[0040] (1) The magnesium alloy is placed in an 800L plasma vacuum reaction chamber, and the reaction chamber is continuously evacuated so that the vacuum degree reaches 50 mTorr.
[0041](2) Introduce helium gas with a flow rate of 50 sccm, turn on the radio frequency plasma discharge to pretreat the magnesium alloy substrate (that is, turn on the radio frequency pretreatment plasma discharge), the discharge power in the pretreatment stage is 20W, and the discharge lasts for 100s .
[0042] (3) The nano-coating was prepared by chemical vapor deposition on the surface of the substrate by introducing monomer S2. The flow rate of the monomer was 300 μL / min. The plasma discharge for pretreatment was adjusted to the plasma discharge for deposition.
[0043] In this deposition stage, the plasma in the cavity is generated by radio frequency discharge, the output mode is pulse, the pulse w...
Embodiment 3
[0046] Compared with Example 1, step (1) is evacuated to 100 mTorr; in step (2), monomer S1 is replaced with monomer S3; same.
[0047]
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