Method for preparing surface coating of zirconium alloy cladding and surface coating
A technology of surface coating and zirconium alloy, which is applied in the direction of metal material coating process, coating, measuring distance, etc., can solve the problems of radioactive material leakage, cladding tube embrittlement, zirconium alloy corrosion, etc., and achieve low preparation technology , high temperature stability, dense and uniform coating effect
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Publication Date
- 2022-01-21
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Abstract
Description
technical field
[0001] The invention relates to the technical field of surface treatment, in particular to a method for preparing a surface coating of a zirconium alloy cladding and a surface coating. Background technique
[0002] Nuclear fuel cladding is the first protective barrier of a nuclear reactor, and its safety is of paramount importance. As far as its working condition is concerned, because one side is close to the high-temperature nuclear fuel pellet part, and the other side is in contact with the coolant under high temperature and high pressure (for example, the temperature is between 280-350°C and the pressure is between 10-16MPa Inter-) contact, so during use, on the side close to the core block, the expanded core block will generate strain with the cladding (PCI, Pellet-Cladding interaction), resulting in stress corrosion cracking (SCC, Stress Corrosion Cracking) of the cladding ), while on the side close to the coolant, it will be corroded by the coolant. T...
Examples
preparation example Construction
[0040] Specifically, the preparation method includes the following steps (combining figure 1 ):
[0041]A zirconium alloy substrate is provided, and the zirconium alloy substrate can be a block substrate and a tubular substrate;
[0042] The zirconium alloy block and tubular substrates are mechanically ground and polished. First, the zirconium alloy substrates are polished several times with 80-mesh to 5000-mesh sandpaper, and then polished, and then placed in a solution composed of acetone and deionized water. Wash for 5-10 minutes, and dry at low temperature;
[0043] Fix the sample (zirconium alloy substrate) after the above treatment in the fixture of the magnetron sputtering apparatus, adjust the target base distance between 40-80mm, and pump the background vacuum to the highest value that the equipment can reach 10 -6 The order of magnitude of Pa. The temperature of the chamber is controlled at room temperature (20°C) to 600°C, and the chamber pressure is adjusted wit...
no. 1 example
[0054] First Example: Single Carbide Coating
[0055] First prepare the zirconium alloy bulk and tubular substrates, wherein the bulk substrate is a zirconium alloy plate with a size of 20mm×20mm×5mm, and the tubular substrate is a zirconium alloy tube with a size of Φ9.5mm, a thickness of 0.57mm and a length of 200mm. For the above zirconium alloy The substrate is mechanically ground and polished. First, the zirconium alloy substrate is polished several times with 80-mesh to 5000-mesh sandpaper, then polished, and then ultrasonically cleaned in a solution composed of acetone and deionized water for 10 minutes, and then dried at a low temperature. deal with.
[0056] Fix the sample after the above treatment in the fixture of the magnetron sputtering apparatus, adjust the base distance of the target at 60 mm, and pump the background vacuum to 10 -3 Pa order of magnitude. The chamber temperature is controlled from room temperature to 400°C. Use argon to adjust the air pressur...
no. 2 example
[0059] Second Example: Composite Carbide Coating
[0060] First prepare the zirconium alloy bulk and tubular substrates, wherein the bulk substrate is a zirconium alloy plate with a size of 20mm×20mm×5mm, and the tubular substrate is a zirconium alloy tube with a size of Φ9.5mm, a thickness of 0.57mm and a length of 200mm. For the above zirconium alloy The substrate is mechanically ground and polished. First, the zirconium alloy substrate is polished several times with 80-mesh to 5000-mesh sandpaper, then polished, and then ultrasonically cleaned in a solution composed of acetone and deionized water for 10 minutes, and then dried at a low temperature. deal with.
[0061] Fix the sample after the above treatment in the fixture of the magnetron sputtering apparatus, adjust the target base distance to 80mm, and pump the background vacuum to 10 -4 Pa. The chamber temperature is controlled from room temperature to 400°C. Use argon to adjust the air pressure of the chamber so tha...