Detector and manufacturing method thereof
A manufacturing method and detector technology, applied in the field of detectors, can solve the problems of inability to detect the temperature of a TFT panel, a small number of temperature sensors, etc., and achieve the effects of reducing the difficulty of hardware design, realizing process compatibility, and flexible setting positions
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Embodiment 1
[0065] Such as figure 1 As shown, the present embodiment provides a method for manufacturing a detector, and the method includes:
[0066] A substrate 100 is provided, the substrate 100 includes a pixel area 101, and a temperature detection area 102 located on the periphery of the pixel area 101;
[0067] Manufacturing a plurality of pixel units 200 arranged in an array in the pixel area 101, and manufacturing at least one temperature detector 300 in the temperature detection area 102;
[0068] Wherein the pixel unit 200 is electrically connected to the driving pad 400 through the scanning line, and is electrically connected to the readout pad 500 through the data line; the temperature detector 300 is connected to the driving pad 400 and the readout pad through the temperature reading line. At least one of the pads 500 is electrically connected.
[0069] It should be noted that, in this embodiment, the scan line is fabricated simultaneously with the gate, the data line is fa...
Embodiment 2
[0094] Such as Figure 14 to Figure 16 As shown, the difference between this embodiment and Embodiment 1 is that the temperature detector 300 in this embodiment is a diode; According to the characteristics, the on-resistance of the diode is changed by the internal temperature of the TFT panel, so that the internal temperature of the TFT panel can be obtained by measuring the resistance value of the on-resistance of the diode. It should be noted that the position of the diode described in this embodiment can be set according to actual needs, and accurate temperature information at different positions can be obtained by changing the position of the diode; that is, the position of the diode described in this embodiment is adjustable, if it is formed in a local location (such as Figure 15 shown), what it acquires is local temperature information, if it is formed on the periphery of the entire pixel unit (such as Figure 14 shown), then what it acquires is the temperature inform...
Embodiment 3
[0115] Such as Figure 17 and Figure 18 As shown, the difference between this embodiment and Embodiment 1 and Embodiment 2 is that: the temperature detector 300 in this embodiment includes metal wires and diodes, wherein the metal wires are connected with several metal structures in the pixel unit 200 At least one of the diodes is produced simultaneously with the photodiode in the pixel unit 200; optionally, the metal wire and at least one of the gate, source, drain and common electrode in the pixel unit Manufactured at the same time; in this embodiment, the number of the metal wire and the number of the diode are both one, and the metal wire and the gate are manufactured at the same time.
[0116] The following takes the existing traditional amorphous silicon X-ray flat panel detector as an example, refer to Figure 17 and Figure 18 , the manufacturing method of the detector described in this embodiment will be described in detail.
[0117] Step 1: If Figure 18 As sho...
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