Analysis Method of Thermal Conductivity of Semiconductor Thin Film Based on Raman Spectroscopy Technology
A technology of Raman spectroscopy and testing technology, which is applied in the field of semiconductor thin film testing, and can solve problems such as poor economy and insufficient accuracy of thermal conductivity characterization and analysis of semiconductor micro-nano thin films.
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[0040] For the thermal conductivity analysis of the semiconductor gallium nitride film, the thickness of the GaN film is 1.2um, and the substrate is SiC material.
[0041] ①Design the microbridge structure of the sample test area of the film to be tested, and prepare the sample based on photolithography, evaporation, and plasma etching techniques: design strip electrodes on the GaN film in the test area, with a width of 5um and a thickness of 100nm. The length is 500um; the size of the circuit connection area at both ends of the linear heat source is 150um*150um, and the thickness is consistent with the electrode thickness; the length and width of the etching area of the micro-bridge structure are 500um*120um. The electrode of the sample is completed by evaporation of gold, and the etching of the SiC substrate is completed by plasma etching.
[0042]② Carry out Raman spectroscopy test at a specific temperature for the film material to be tested, and perform peak-temperatur...
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