Unlock instant, AI-driven research and patent intelligence for your innovation.

One-step preparation method of heterogeneous uniform load

A technology of uniform loading and loading, applied in chemical instruments and methods, catalyst activation/preparation, hydrogen production, etc., can solve the problems of unfavorable and environmentally friendly by-products, difficult to construct composite structures, uneven loading, etc., and achieve good applications. The effect of foreground, uniform loading, and simple preparation method

Active Publication Date: 2021-10-29
苏州璋驰光电科技有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The two-phase composite method generally has problems such as complicated preparation or uneven loading, and many by-products that are not conducive to environmental friendliness are generated, making many composite structures difficult to construct.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • One-step preparation method of heterogeneous uniform load
  • One-step preparation method of heterogeneous uniform load
  • One-step preparation method of heterogeneous uniform load

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0017] A one-step preparation method for a heterogeneous uniform load, comprising:

[0018] Place multiple volatiles in different temperature zones of the quartz tube;

[0019] Auxiliary gas is introduced into the quartz tube, and multi-phase uniform loads are formed by calcining downstream of the flow direction of the auxiliary gas in the quartz tube.

[0020] In detail, heterogeneous supports can be prepared by a fast and simple one-step method, and the heterogeneous supported compounds with controllable loading process have great application prospects for photocatalytic hydrogen production.

[0021] Further, in a preferred embodiment of the present invention, placing multiple volatiles in different temperature zones of the quartz tube respectively includes: placing two volatiles in different temperature zones of the quartz tube respectively. Of course, in other embodiments of the present invention, the number of volatiles may be multiple, not limited to two, but may be thr...

Embodiment 1

[0032] This embodiment provides a one-step preparation method for heterogeneous uniform loads, including the following steps:

[0033] S1: Add 5g of MoO to 3and 0.6g of CdS are placed in different temperature zones in the quartz tube, and the temperature of the position of CdS is 780-795 ° C, MoO 3 The temperature at the location is 795-805°C;

[0034] S2: Add auxiliary gas to the quartz tube to make CdS and MoO 3 Calcination in a quartz tube to form CdS / MoO 2 load.

Embodiment 2

[0036] This embodiment provides a one-step preparation method for heterogeneous uniform loads, including the following steps:

[0037] S1: Add 5g of MoO to 3 and 1.0g of CdS are placed in different temperature zones in the quartz tube, and the temperature of the position of CdS is 790°C, MoO 3 The temperature at the location is 800°C;

[0038] S2: Add auxiliary gas to the quartz tube to make CdS and MoO 3 Calcination in a quartz tube to form CdS / MoO 2 load.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a one-step preparation method for multiphase uniform loads, and relates to the technical field of preparation of multiphase loads. The one-step preparation method of the multi-phase uniform load includes placing a plurality of volatiles in different temperature zones of the quartz tube respectively; feeding auxiliary gas into the quartz tube, and calcining downstream of the flow direction of the auxiliary gas in the quartz tube to form a multi-phase uniform load. and specifically will utilize CdS and MoO 3 The volatilization temperature is similar and can be blown out with the air flow. The two co-volatize and react in the high temperature area to obtain CdS nanoparticles in ultra-thin hexagonal MoO 2 The composites are uniformly loaded on the nanosheets and have good photocatalytic hydrogen production performance. This method has the characteristics of simple preparation method, low preparation cost, no by-products that are harmful to the environment, uniform loading, and excellent performance when used in multi-phase loading. It is very good for the preparation of some two-phase materials in the energy environment. Application prospect.

Description

technical field [0001] The invention relates to the technical field of preparation of heterogeneous loads, and in particular to a one-step preparation method of multi-phase uniform loads. Background technique [0002] Today, the energy crisis is still a major problem in the world's progress and development. The development of clean and renewable hydrogen energy has become a hot spot in today's development. Because traditional hydrogen production technology consumes a lot of non-renewable energy and produces pollution, photocatalytic water splitting Hydrogen production technology has become a hot spot in energy technology today. The basic requirement of photocatalytic semiconductors is that firstly, the conduction band position must be negative than zero, and the valence band position must be greater than 1.23ev, that is, the forbidden band width must span and be greater than 1.23ev before it can be used for photocatalytic water splitting. Secondly, the commonly used semicond...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B01J27/051B01J37/08B82Y30/00B82Y40/00C01B3/04
CPCB82Y30/00B82Y40/00C01B3/042B01J27/051B01J37/08C01B2203/1041C01B2203/0277B01J35/39Y02E60/36
Inventor 周伟家刘慧赵莉莉余加源贾进刘宏
Owner 苏州璋驰光电科技有限公司