A multi-source driven ultrasonic atomization device

Abstract

The invention relates to an ultrasonic atomization device, in particular to a multi-source driven ultrasonic atomization device capable of guiding the directional deposition of atomized droplets, improving the spraying efficiency of atomized droplets and the uniformity of film formation, including a controllable syringe pump, Liquid conduit, liquid dispensing device, gas hood, high-voltage power supply, collecting plate, support plate and ultrasonic device, one end of the liquid conduit is connected to the controllable syringe pump, the other end is connected to the liquid inlet of the liquid dispensing device, and the gas hood is set on the liquid dispensing device The liquid outlet direction, the collecting plate is set under the liquid separation device and the gas hood, the high voltage power supply is electrically connected with the liquid separation device and the collection plate, the support plate is set between the liquid separation device and the gas hood, and the ultrasonic device is set on the support plate , the ultrasonic device is connected with a nozzle, and the gas mask is provided with a nozzle, and the nozzle is opposite to the nozzle. The invention can improve the spraying efficiency of the atomized liquid droplets, and the surface of the atomized liquid droplets is charged under the action of a high-voltage electrostatic field, repelling each other, and overcomes the problem that the aggregation of the droplets affects the uniformity of film formation.

Description

Technical field[0001]The invention relates to an ultrasonic atomization device, in particular to a multi-source driven ultrasonic atomization device which can guide the directional deposition of atomized droplets and improve the spraying efficiency of atomized droplets and the uniformity of film formation.Background technique[0002]The traditional ultrasonic atomization method uses ultrasonic directed pressure to bulge the surface of the liquid, and cavitation occurs around the raised liquid surface to atomize the liquid into droplets of small molecules. Compared with other atomization methods, ultrasonic atomization has the advantages of small droplets, uniform size distribution, high roundness, relatively large atomization volume and low liquid delivery pressure. Therefore, ultrasonic atomization is widely used in atomization. Cultivation, agricultural humidification, chemical atomization treatment, and semiconductor etching. However, the traditional ultrasonic atomization method h...

AI Technical Summary

Problems solved by technology

However, the power source of the traditional ultrasonic atomization method is only the ultrasonic device, the injection speed of the atomized droplets is slow, and it is easy to accumulate in the cavity, which affects the injection of subsequent droplets, and the efficiency of droplet injection is low.

And the distribution of ultrasonic atomized droplets is poor, and only a small amount of atomized droplets can be obtained on the collecting plate

In addition, due to the slow deposition speed of ultrasonic atomized droplets, the speed of falling on the collecting plate is almost zero, it is difficult to adhere to the collecting plate, and it is easy to drift due to the influence of the external environment, and the film quality is poor

Images