Laser annealing device, array substrate, display device and manufacturing method
A technology of laser annealing and array substrates, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of long debugging time of equipment and process, long time of display device production, etc., and achieve size matching, convenient replacement, and location consistent effect
Active Publication Date: 2022-04-12
BOE TECH GRP CO LTD
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[0004] The present invention provides a laser annealing device, an array substrate, a display device and a manufacturing method to solve the problem that the annealing device in the prior art needs to replace the matching MLA mask and micro Lens arrangement, which in turn leads to a long time for equipment and process debugging, and a long time for the production of display devices
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[0040] In order to make the purposes, technical solutions and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are some, but not all, embodiments of the present disclosure. Based on the described embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the protection scope of the present disclosure.
[0041] Unless otherwise defined, technical or scientific terms used in this disclosure shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. As used in this disclosure, "first," "second," and similar terms do not denote any order, quantity, or importance, but are merely used ...
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The invention discloses a laser annealing device, an array substrate, a display device and a manufacturing method to solve the problem that the annealing device in the prior art needs to replace the matching MLA mask and The arrangement of the microlenses further leads to the problems of longer equipment and process debugging time, and longer production time of the display device. The laser annealing device includes: a light source structure, a microlens array structure arranged on the light emitting side of the light source structure and a mask replacement structure stacked on each other, wherein the microlens array structure includes a plurality of microlenses arranged in an array , the mask replacement structure includes a mask plate, and a replacement part for replacing the mask plate according to the difference of the array substrate to be annealed, and the mask plate is reused as a film for the array substrate A mask for layer patterning.
Description
technical field [0001] The present invention relates to the technical field of semiconductors, and in particular, to a laser annealing device, an array substrate, a display device and a manufacturing method. Background technique [0002] Low temperature polysilicon thin film transistors can be used as backplanes for liquid crystal displays and active-matrix organic light-emitting diodes (AMOLEDs) to drive displays. When a low temperature polysilicon thin film transistor is used for driving, the amorphous silicon thin film is generally annealed by a laser annealing device to form polysilicon. In a conventional laser annealing device, a microlens array mask (MLA mask) and a microlens array are generally used to focus light on the area of the array substrate where the thin film transistors are arranged, so as to anneal the area. [0003] But traditional MLA mask designs and microlens array arrangements are generally fixed to match specific display products and meet annealing...
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IPC IPC(8): H01L21/67H01L21/268
Inventor 龙春平
Owner BOE TECH GRP CO LTD