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A photomask and exposure system

An exposure system and photomask technology, which is applied in the display field, can solve the problems of large exposure plane step difference and ineffective exposure, etc., and achieve the effect of solving the short circuit problem

Active Publication Date: 2021-02-02
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The purpose of the present invention is to propose a photomask and an exposure system aimed at the defects in the background technology, which can effectively solve the problem that the exposure cannot be effectively exposed when the level difference of the exposure plane is large

Method used

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  • A photomask and exposure system
  • A photomask and exposure system
  • A photomask and exposure system

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Embodiment

[0028] A FMLOC photomask applied to AMOLED, characterized in that the photomask includes a substrate 2, a metal pattern 1 formed on the substrate 2, and an optical depth of focus formed on the upper surface of the substrate Compensation film3. The optical focal depth compensation film is located directly above the non-display area and completely covers the non-display area, and can change the local focal depth of light.

[0029] Such as Figure 4 As shown, it is a schematic structural diagram of the exposure system based on the photomask provided by the embodiment of the present invention; in the display area A and the non-display area B (Bonding area), the B area changes its exposure due to the use of an optical focal depth compensation film. The process environment can obtain different depths of focus, and then can obtain the best focus plane with different heights. Specifically: when the exposure machine adopts the Normal Mask, the depth of focus at 2 μm resolution is 10 ...

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Abstract

The invention provides a photomask plate and belongs to the field of display technology. The photomask includes a mask with a pattern, and an optical depth of focus compensation film arranged on the upper or lower surface of the mask with a pattern, and the optical depth of focus compensation is located directly above the area with a small step difference And only the area with small step difference is completely covered, and the local focal depth of light can be changed. The optical focal depth compensation film added on the upper surface or the lower surface of the mask in the present invention can adjust the phase of light and the process factor K 2 Make adjustments to change the depth of focus of the non-display area, adjust the exposure capability of the non-display area, and effectively solve the short circuit problem after the exposure of the wiring.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an OLED photomask, a preparation method and an exposure system. Background technique [0002] AMOLED (Active Matrix Organic Light Emitting Diode Display, active matrix drive organic light emitting diode display device) has the advantages of low manufacturing cost, high response speed, power saving, DC drive for portable devices, and wide operating temperature range. LCD (Liquid Crystal Display, Liquid Crystal Display) next-generation new flat-panel display. In particular, flexible AMOLEDs are attracting more and more attention due to their advantages of being thin, light, bendable and foldable, and can change shape arbitrarily. [0003] When AMOLED is applied, it is usually necessary to set up an encapsulation cover to achieve the function of blocking water and oxygen. The package cover used may be a glass cover or a thin film encapsulation (Thin Film Encapsulation, TFE) proce...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00
Inventor 尚飞向勇
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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