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Thin film structure for boron-enriched coating of boron-coated neutron detector

A neutron detector and thin film structure technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problems of high cost and high requirements, achieve low stress, improve adhesion effect, and enhance adhesion effect of effect

Pending Publication Date: 2019-06-07
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has high requirements on the structure of the magnetron sputtering equipment, and the preparation of B 4 The cost of C film is also high

Method used

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  • Thin film structure for boron-enriched coating of boron-coated neutron detector
  • Thin film structure for boron-enriched coating of boron-coated neutron detector

Examples

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Embodiment 1

[0027] A thin-film structure for boron-rich coatings on boron-coated neutron detectors, such as figure 1 shown, including substrates 1 and B 4 C Film 2, Substrate 1 and B 4 A metal layer 3 with a certain thickness is arranged between the C films 2 . The aluminum material model of base 1 is AA1060; B 4 The thickness of the C film is 1.2 μm; the material of the metal layer 3 is an active metal, and the Gibbs free energy of the active metal of the active metal does not exceed the Gibbs free energy of the Al metal. , able to get from Al 2 o 3 In order to obtain more O elements, the material of the metal layer 3 in this embodiment is a MgAl alloy with a thickness of 15 nm.

[0028] Metal layers 3 and B 4 The C thin film 2 is prepared by magnetron sputtering. In this embodiment, the preparation of metal layers 3 and B 4 The sputtering gas for C film 2 is pure Ar gas, and the B 4 The sputtering pressure of C film 2 is 10mTorr, and loose B 4 C film 2, reduce B 4 The stress ...

Embodiment 2

[0031] A thin-film structure for boron-rich coatings on boron-coated neutron detectors, such as figure 1 shown, including substrates 1 and B 4 C Film 2, Substrate 1 and B 4 A metal layer 3 with a certain thickness is arranged between the C films 2 . The aluminum material model of the base 1 is AA1060. B 4 The thickness of the C film was 1 μm. The material of the metal layer 3 is an active metal, and the Gibbs free energy of the active metal of the active metal does not exceed the Gibbs free energy of the Al metal. 2 o 3 In order to obtain more O elements, the material of the metal layer 3 in this embodiment is a MgAl alloy with a thickness of 100 nm.

[0032] Metal layers 3 and B 4 The C thin film 2 is prepared by magnetron sputtering. In this embodiment, the preparation of metal layers 3 and B 4 The sputtering gas for C film 2 is pure Ar gas, and the B4 The sputtering pressure of C film 2 is 12mTorr, and loose B 4 C film 2, reduce B 4 The internal stress of the C f...

Embodiment 3

[0034] A thin-film structure for boron-rich coatings on boron-coated neutron detectors, such as figure 1 shown, including substrates 1 and B 4 C Film 2, Substrate 1 and B 4 A metal layer 3 with a certain thickness is arranged between the C films 2 . The aluminum material model of the base 1 is AA1060. B 4 The thickness of the C film was 2 μm. The material of the metal layer 3 is an active metal, and the Gibbs free energy of the active metal of the active metal does not exceed the Gibbs free energy of the Al metal. 2 o 3 In order to obtain more O elements, the material of the metal layer 3 in this embodiment is MgAl alloy, and its thickness is 50 nm.

[0035] Metal layers 3 and B 4 The C thin film 2 is prepared by magnetron sputtering. In this embodiment, the preparation of metal layers 3 and B 4 The sputtering gas for C film 2 is pure Ar gas, and the B 4 The sputtering pressure of C film 2 is 11mTorr, and loose B 4 C film 2, reduce B 4 The internal stress of the C ...

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Abstract

The invention relates to a thin film structure for a boron-enriched coating of a boron-coated neutron detector. The thin film structure comprises a substrate and a B4C thin film and is characterized in that a metal layer is arranged between the substrate and the B4C thin film, the metal layer is made of active metal, the active metal is selected from one of Ti, Ni, Al, Mg or MgAl alloy preferably,and the thickness of the metal layer is smaller than 100 micrometers. Compared with the prior art, the thin film structure enhances the bonding effect between the B4C thin film and the aluminum substrate greatly, the problem that the B4C thin film falls off from the aluminum substrate, and the thin film structure has the advantages that preparation is easy, the film structure is simple, the technology is mature, and the preparation performance is high.

Description

technical field [0001] The invention relates to the field of thin film preparation, relates to a boron-coated neutron detector, in particular to a thin-film structure used for a boron-rich coating of a boron-coated neutron detector. Background technique [0002] The commonly used neutron detector is 3He neutron detector, but the inventory of 3He gas is decreasing day by day, and domestic and foreign countries have gradually begun to develop boron-coated neutron detectors. For boron-coated neutron detectors working under neutron beams, the substrate is an aluminum substrate, and the coating that reacts with neutrons on the substrate surface is a boron-rich coating, which is composed of B4C thin film. neutron enters B 4 C film, will and B 4 10B in C reacts and converts to alpha particles. Alpha particles enter and ionize the working gas in the boron-coated neutron detector, and the generated electrons have an avalanche effect, and the detector begins to output charge signal...

Claims

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Application Information

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IPC IPC(8): C23C14/06C23C14/16C23C14/35
Inventor 齐润泽张众王占山冯秦旭
Owner TONGJI UNIV