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Method for manufacturing cathode of display panel, display panel and display device

A manufacturing method and display panel technology, applied in the field of OLED panels, can solve problems such as light-emitting layer damage, and achieve the effect of preventing physical damage and bombardment loss

Active Publication Date: 2019-06-28
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The invention provides a method for manufacturing a cathode of a display panel, a display panel and a display device, which are used to solve the technical problem of damage to the light-emitting layer existing in the prior art when a sputtering process is used to manufacture a transparent cathode

Method used

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  • Method for manufacturing cathode of display panel, display panel and display device

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Embodiment Construction

[0048] Embodiments of the present invention provide a method for manufacturing a cathode of a display panel, a display panel and a display device, so as to solve the technical problem existing in the prior art that the light-emitting layer is damaged when a sputtering process is used to manufacture a transparent cathode.

[0049] The technical solution in the embodiment of the present application is to solve the above-mentioned technical problems, and the general idea is as follows:

[0050] A method for manufacturing a cathode of a display panel is provided, comprising: forming a magnetic ionic liquid layer on the surface of a substrate on which an organic functional layer has been formed; adopting magnetron sputtering, using the magnetic ionic liquid layer as a buffer layer for sputtering ions, A transparent metal oxide electrode is formed on the surface of the substrate on which the organic functional layer has been formed.

[0051] In the above scheme, after forming the ma...

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Abstract

The invention discloses a method for manufacturing a cathode of a display panel, the display panel and a display device to solve the technical problem that a light-emitting layer is damaged when a transparent cathode is formed by a sputtering process in the prior art. The method comprises a step of forming a magnetic ionic liquid layer on the surface of a substrate on which an organic functional layer is formed, and a step of forming a transparent metal oxide electrode on the surface of the substrate on which the organic functional layer is formed by using magnetically controlled sputtering with the magnetic ionic liquid layer as a buffer layer for sputtering ions.

Description

technical field [0001] The invention relates to the field of OLED panels, in particular to a method for manufacturing a cathode of a display panel, a display panel and a display device. Background technique [0002] In a top-emitting OLED device, in order to allow the light emitted by the light-emitting layer to pass through the cathode and exit from the top of the OLED, a transparent cathode is required. [0003] There are usually two material systems available for making transparent cathodes: one is a magnesium / silver (Mg / Ag) composite electrode, and the other is a metal oxide, such as indium tin oxide (IndiumTinOxides, ITO) or indium zinc oxide (IZO ). [0004] Due to the high transmittance of metal oxides, when metal oxides are used to make transparent cathodes, they are generally formed by sputtering, but the sputtering process will cause damage to the light-emitting layer below the transparent cathode, thereby affecting the luminous efficiency of OLEDs. and lifespan ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/52H01L51/56H01L27/32
CPCH10K71/00H10K59/80524H10K71/60
Inventor 代青
Owner BOE TECH GRP CO LTD
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