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Photocurable composition and photocurable film formed therefrom

A photocurable and composition technology, applied in the field of photocurable films and photocurable compositions, can solve the problems of rising composition viscosity, limitations of fine patterning, etc., and achieve the effect of low viscosity

Active Publication Date: 2021-11-23
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, when an alkali-soluble resin is included, the viscosity of the composition increases and there is a limit in achieving the desired fine patterning

Method used

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  • Photocurable composition and photocurable film formed therefrom
  • Photocurable composition and photocurable film formed therefrom
  • Photocurable composition and photocurable film formed therefrom

Examples

Experimental program
Comparison scheme
Effect test

experiment example

[0182] The compositions in Tables 1 and 2 or the photocured films formed from these compositions were evaluated for viscosity, degree of surface curing, and Martens hardness by the evaluation method described later.

[0183] The evaluation results are shown in the following Tables 3 and 4 together with the sum of the double bond equivalent and the number of substitutions of each composition.

[0184] (1) Viscosity measurement

[0185] The viscosity of each composition of an Example and a comparative example was measured (measurement condition: 20 rpm / 25 degreeC) using the viscometer (DV3T, the Brookfield company make).

[0186] (2) Surface curing degree

[0187] The photocurable compositions of Examples and Comparative Examples were coated on silicon wafers cut to a size of 50 mm×50 mm, spin-coated so that the film thickness reached 3.0 μm, placed in an acrylic box, and replaced with a nitrogen atmosphere. Then, use UV curing device (Lichtzen company, model: LZ-UVC-F402-...

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Abstract

The present invention provides a photocurable composition and a photocurable film formed therefrom. The photocurable composition of the embodiment of the present invention comprises: containing at least two kinds of monomers, having 7.0×10 ‑3 A monomer mixture having a double bond equivalent of mol / g or more and a sum of substitution numbers of 5 or more; and a photoinitiator, wherein the viscosity of the photocurable composition at room temperature is 15 cp or less. Compositions and photocurable films with low-viscosity, high-density crosslinking properties can be realized from the monomer mixture.

Description

technical field [0001] The present invention relates to a photocurable composition and a photocurable film formed from the photocurable composition. More specifically, it relates to a photocurable composition containing a photopolymerizable monomer, and a photocurable film formed from the photocurable composition. Background technique [0002] In order to form various photocurable insulating patterns such as photoresists, insulating films, protective films, black matrices, and columnar spacers of display devices, photosensitive compositions are used. After applying the above-mentioned photosensitive composition, a photocured pattern of a predetermined shape can be formed in a desired region through an exposure step and / or a development step. The above-mentioned photosensitive composition needs to have, for example, high sensitivity to ultraviolet light exposure and polymerization reactivity, and the pattern formed from the photosensitive composition needs to have improved h...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004
CPCG03F7/004G03F7/027G03F7/028
Inventor 赵庸桓朴汉雨金在成
Owner DONGWOO FINE CHEM CO LTD