Modeling method for forming and positioning internal defects of three-dimensional photonic crystal
A technology of photonic crystals and internal defects, applied in special data processing applications, instruments, electrical digital data processing, etc., can solve problems that restrict the performance of three-dimensional photonic crystal devices and poor compatibility
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[0041] In order to illustrate the embodiments of the present invention more clearly, the specific implementation manners of the present invention will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention, and those skilled in the art can obtain other accompanying drawings based on these drawings and obtain other implementations.
[0042] The modeling method for forming and locating internal defects in a three-dimensional photonic crystal according to an embodiment of the present invention specifically includes the following steps:
[0043] Step 1: If figure 1 As shown, the basic parameters for designing a two-dimensional array of cylindrical holes include: hole diameter D, hole depth H, and hole distance D s ;Adjust the parameter variables of the external ultrasonic wave, including: the emission speed c of the ultrasonic wave 0 , the emission frequ...
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