Exposure method for sequencing, sequencing method and device, and storage medium
A technology of exposure device and exposure method, which is applied in the field of sequencing, can solve the problem of excessive exposure time and achieve the effect of accurate sequencing results
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Embodiment 1
[0067] This example is based on the sequencer BGISEQ-500RS platform of Huada Genomics; the reagents used come from the library construction kit and single-end sequencing kit used with the sequencer; the verification samples used are from Escherichia coli; The sequencer, reagent operation and other processes used in the process refer to the usage method of the platform; taking SE200 sequencing as an example, the design range of gradient exposure time is 10-140ms.
[0068] In this embodiment, three groups of exposure times are designed for comparison:
[0069] The first group: keep the overall exposure time at 100ms, that is, maintain a constant exposure time.
[0070] The second group: according to exposure time (ms)=A+B·Exp(C·cycle# / N-D), wherein, A=30, B=70, C=3, D=3, N=200, make the exposure time The gradient changes from 34ms to 100ms, which is the exposure time change within the design range.
[0071] The third group: according to exposure time (ms)=A+B·Exp(C·cycle# / N-D)...
Embodiment 2
[0078] This implementation case is based on the sequencer BGISEQ-500RS platform of Huada Genomics; the reagents used are all derived from the library construction kit and paired-end sequencing kit (hereinafter referred to as the PE100 kit) used with the sequencer; the verification samples used It is derived from Escherichia coli; the sequencer, reagent operation and other processes used in the verification process refer to the usage method of this platform; this implementation case takes PE100 sequencing as an example, and the design range of gradient exposure coefficient is 10-130ms.
[0079] In this embodiment, five groups of exposure times are designed for comparison:
[0080] The first group: according to exposure time (ms)=A+B·Exp(C·cycle# / N-D), wherein, A=40.6, B=13.8, C=2, D=2, N=100, make a chain The exposure time was gradually increased from 43ms to 53ms, and the exposure time of the second chain was 50ms for the first part, and 80ms for the latter part.
[0081] The...
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