A multipurpose chemical vapor deposition device

Abstract

The invention provides a multi-purpose chemical vapor deposition device, the top is a plasma source, and a heat exchanger is arranged in the middle of the inner cavity of the device, and the heat exchanger divides the inner cavity of the device into an upper deposition reaction chamber and a lower gas collection chamber. There are two parts of the chamber; the heat exchanger is provided with a through hole that can communicate the deposition reaction chamber and the gas collection chamber; the deposition reaction chamber is provided with a deposition platform, and the deposition platform drive shaft is connected to the bottom of the deposition platform. The drive shaft of the deposition table passes downward through the two parts of the heat exchanger and the gas collection chamber, and extends to the outside of the gas collection chamber; a vacuum system interface is provided in the middle of the lower part of the gas collection chamber. The invention can overcome the deficiencies of the prior art, accurately control the operating conditions of the deposition environment, obtain a uniform deposition coating or film, and is especially suitable for the preparation of diamond materials.

Description

technical field [0001] The invention relates to the technical field of chemical vapor deposition equipment, in particular to a multipurpose chemical vapor deposition device, which is especially suitable for the preparation of diamond coatings and diamond films. Background technique [0002] Diamond is an allotrope of carbon with a series of excellent physical properties, the highest hardness, wear resistance and elastic modulus among known natural substances, extremely high resistivity, breakdown field strength and very low High dielectric constant, wide spectral transmission range, extremely high thermal conductivity, extremely low linear expansion coefficient, wide band gap, extremely high carrier mobility and good chemical stability. [0003] The combination of diamond-like coating and the good toughness of cemented carbide solves the brittle defect of diamond. Because the coating is relatively thin, the production cost is greatly reduced, so it has a wide range of applic...

AI Technical Summary

Problems solved by technology

[0005] The existing chemical vapor deposition device is extremely inconvenient to adjust and control the deposition position and the environment, and the response speed of the environment adjustment is relatively slow, and the local working temperature, angle, and air flow in the deposition area are easy to deviate from the operating control range, making the uniformity of diamond deposition Difficult to achieve high precision and prone to structural damage

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