Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Full-caliber polishing immersing type element machining device and method and polishing machine

A processing device and immersion technology, applied in grinding/polishing safety devices, metal processing equipment, grinding/polishing equipment, etc., can solve problems such as deteriorating component surface shape and component deformation, reduce deformation and improve temperature distribution The effect of uniformity

Pending Publication Date: 2019-08-23
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of this, the present invention provides a full-diameter polishing submerged component processing device, which solves the technical problem in the prior art that the component is deformed due to uneven temperature field during component processing, thereby deteriorating the surface shape of the component

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Full-caliber polishing immersing type element machining device and method and polishing machine
  • Full-caliber polishing immersing type element machining device and method and polishing machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0026] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0027] The embodiment of the invention discloses a full-diameter polishing submerged component processing device, which solves the technical problem in the prior art that the component is deformed due to uneven temperature distribution during component processing, thereby deteriorating the surface shape of the component.

[0028] See attached figure 1 , provides a full-bore polishing submerged component processing device, including:

[0029] The workpiece dis...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a full-caliber polishing immersing type element machining device and method and a polishing machine. The full-caliber polishing immersing type element machining device comprises a workpiece disc and a polishing liquid conveying pump, wherein an immersing chamber is defined at the middle portion of the workpiece disc and used for immersing an element during machining, the liquid outlet end of the polishing liquid conveying pump is connected to the upper portion of the immersing chamber through a polishing liquid conveying pipe for polishing liquid spraying, and the liquid inlet end of the polishing liquid conveying pump is connected with a polishing liquid storage barrel. It can be known from the above technical scheme that compared with the prior art, the full-caliber polishing immersing type element machining device is provided, the element is placed in the immersing chamber, the polishing liquid conveying pump supplies liquid, the polishing liquid flows in from the top of the immersing chamber, the polishing liquid and various surfaces of the element during machining conduct heat, temperature distribution uniformity in the element can be better improved,and deformation caused by uneven temperature distribution is reduced.

Description

technical field [0001] The invention relates to the technical field of optical element processing, and more specifically relates to a full-diameter polishing submerged element processing device, processing method and polishing machine. Background technique [0002] Full-aperture polishing is one of the key technologies for processing large-aperture planar optical components. The full-bore polishing machine usually uses large-size, high-thermal-stability natural granite to make the polishing disc base plate, and the surface of the base plate is cast with a ring-shaped asphalt rubber layer as the polishing disc. The ring surface of the asphalt polishing disc is sequentially placed with a correction disc and a workpiece disc, wherein the correction disc is used to correct and control the shape error of the polishing disc, while the workpiece disc is used to hold the component. During processing, the polishing disk, correction disk and workpiece disk all rotate counterclockwise...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B13/00B24B13/005B24B13/01B24B57/02B24B55/02B24B1/00
CPCB24B13/00B24B13/005B24B13/01B24B57/02B24B55/02B24B1/00
Inventor 廖德锋谢瑞清王乙任赵世杰张飞虎王健许乔
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com