Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

OVD device with high deposition qualification rate

A deposition device and a pass rate technology, applied in the field of OVD deposition devices with high deposition pass rate, can solve the problems of fiber preform loose body coming out of the chuck, low deposition pass rate of fiber preform soot body, etc., so as to improve deposition pass rate. The effect of reducing the concentricity error of the core package and improving the diameter uniformity

Active Publication Date: 2019-09-03
TONGDING INTERCONNECTION INFORMATION CO LTD +1
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is: in order to solve the technical problem that the loose body of the optical fiber preform is easy to slide in the chuck or even break away from the chuck in the existing OVD deposition process, so that the deposition pass rate of the loose body of the optical fiber preform is low, thereby Provide an OVD deposition device with high deposition pass rate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • OVD device with high deposition qualification rate
  • OVD device with high deposition qualification rate
  • OVD device with high deposition qualification rate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0037] This embodiment provides an OVD deposition device with a high deposition pass rate, such as figure 1 and figure 2 shown, including:

[0038] The deposition box 1 has a deposition cavity 11 for accommodating the preform soot or core rod 3;

[0039] The support structure 2 is arranged on one side of the deposition cavity 11; as image 3As shown, the bearing support structure 2 includes a fixed seat 21 (specifically, a bearing seat), a sliding ring 22 (specifically, a bearing), a fixed tube 23, and a pressing member 24. The fixed seat 21 is arranged in the deposition box 1 , the sliding ring 22 is accommodated in the fixing seat 21, the fixing tube 23 extends into the hole of the sliding ring 22 from one side of the sliding ring 22, and the cavity of the fixing tube 23 is provided with a loose body or a core for fixing the preform rod The elastic part 25 of the rod 3 (such as the O-shaped rubber sealing ring for the loose body of the preform rod or the mandrel 3 to pas...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an OVD device with high deposition qualification rate. The device includes: a deposition box body, support structures, chuck rod fixed structures, blowtorches and a ventilation system. Specifically, the support structures are arranged at one side in a deposition cavity, each support structure includes a fixed seat, a sliding ring, a fixed pipe and a compression member, andis used for fixing one end of a preform rod loose body or core rod. The chuck rod fixed structures are disposed at the other side in the deposition cavity, and each chuck rod fixed structure includesa chuck rod for fixing the other end of the preform rod loose body or core rod, and the chuck rod is connected to a driving apparatus and can be driven by the same to rotate. The OVD device providedby the invention makes the preform rod loose bodies or core rods cannot slide in the sliding bearing support structures or slide out of the bearing support structures, thus ensuring that the whole preform rod loose bodies or core rods do not move back and forth or slide out of the clamps, and enhancing the deposition qualification rate of the preform rod loose bodies or core rods.

Description

technical field [0001] The application belongs to the technical field of optical fiber preform manufacture, and in particular relates to an OVD deposition device with high deposition pass rate. Background technique [0002] The OVD process (that is, external vapor deposition method) is one of the main process methods for preparing low water peak or zero water peak single-mode optical fiber preforms. This process can produce larger-sized optical fiber preforms, which can effectively reduce manufacturing costs. It is widely used by mainstream optical fiber preform manufacturers at home and abroad. The OVD process has unique technical advantages as a process for producing preforms. Its main principle is to spray high-purity gas-phase raw materials (usually silicon tetrachloride evaporation raw materials) on the outside of the mandrel through a blowtorch. 2 Chemical reaction with water vapor to form SiO 2 Fine particles are deposited on the mandrel by the thermophoretic effect...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03B37/014
CPCC03B37/01486
Inventor 沈小平崔德运朱陈明何炳刘建中杨意蒋锡华朱坤
Owner TONGDING INTERCONNECTION INFORMATION CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com