A method for measuring the intrinsic deposition rate of a CVD/CVI process precursor
A technology of deposition rate and precursor, applied in metal material coating process, material absorption weighing, coating, etc., can solve the problems of high cost, difficult optical and electrical methods, etc., and achieve low cost and convenient operation. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0035] A method for measuring the intrinsic deposition rate of a CVD / CVI process pyrolytic carbon precursor, comprising the following steps:
[0036] 1) Deposition substrate preparation: Prepare 7 cylindrical porous ceramic sheets, numbered 1, 2, 3, 4, 5, 6, 7, and weigh them to obtain their masses: 2.6288 g, 2.5583 g, 2.5301 g, 2.5613 g, 2.5823 g , 2.5672 g, 2.5980 g;
[0037] 2) Mold assembly: put 7 porous ceramic sheets vertically into the graphite mold in sequence, and assemble the mold;
[0038] 3) CVD / CVI deposition: put the mold into the constant temperature area of the deposition furnace, feed nitrogen as a protective gas to raise the temperature, and control it to 5 kPa by a vacuum pump after reaching 950 °C, and feed propylene for CVD / CVI deposition;
[0039] 4) Weighing of the deposition substrate: After the deposition is completed, nitrogen gas is introduced to restore the pressure in the deposition furnace to normal pressure. After the temperature cools to room...
Embodiment 2
[0045] A method for measuring the intrinsic deposition rate of a CVD / CVI process pyrolytic carbon precursor, comprising the following steps:
[0046] 1) Deposition substrate preparation: prepare a cylindrical porous ceramic sheet and weigh it to obtain a mass of 2.9867 g;
[0047] 2) Mold assembly: put the ceramic sheet into the graphite mold and assemble the mold;
[0048] 3) CVD / CVI deposition: put the mold into the constant temperature area of the deposition furnace, control the residence time to 0.125 s, pass in nitrogen as a protective gas to raise the temperature, and control it to 5 kPa by a vacuum pump after reaching 975 °C, and pass in propylene for CVD / CVI deposition;
[0049] 4) Weighing of the deposition substrate: After the deposition is completed, nitrogen gas is introduced to restore the pressure in the deposition furnace to normal pressure. After the temperature cools to room temperature, the nitrogen gas is stopped, and the mold is taken out from the depositi...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


