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Film-formation method

A film-forming method and film-forming technology, applied in instruments, optical components, vacuum evaporation coating, etc., can solve problems such as light spots, ghosting, low reflectivity, and inability to maintain

Active Publication Date: 2019-09-27
TOKAI UNIV +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0002] CCD and CMOS used as imaging elements reflect light on the surface more strongly than silver salt film, so flare and ghosting are prone to occur
In addition, in the case of a lens with a small radius of curvature, the incident angle of light rays varies greatly depending on the position, so it is not possible to maintain low reflectance at the portion where the lens surface has a large inclination
In addition, in flat-panel displays such as LCDs, reflection glare of external light caused by light reflection on the display surface becomes a problem, so anti-glare treatment is implemented. Diffuse reflections from anti-glare treated surfaces prevent image resolution enhancement

Method used

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Examples

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Embodiment

[0055] "Examples and Comparative Examples"

[0056] use figure 1 , figure 2 The film forming device, through image 3 In the method shown, the target film thickness was set to 500 nm, and the glass substrate S (N-BK7 manufactured by SCHOTT Co., Ltd., thickness 1.0 mm, 40×40 mm, refractive index n d : 1.5168) single-sided film formation of SiO 2Film, using a spectrophotometer (manufactured by JASCO Corporation V-570) to measure the spectral transmittance, calculate the refractive index of the film after film formation from the transmittance, and carry out the cross-cut test for the same film (according to JISB7080-4 Optical And Photonics-Optical Coatings-Part 4: Specific Test Method 7. Cross-hatch Test (Condition Method 03))) and Pencil Hardness Test (according to JIS K5600 Coatings General Test Method 4.4 Scratch Hardness (Pencil Method)). The film-forming conditions of the film-forming apparatus at this time are as follows.

[0057] The ratio of the volume of the vacuum...

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Abstract

Provided is a film-formation method for a surface layer having high mechanical strength and a low refractive index. A step for depositing a vapor deposition material by vacuum deposition on the surface of a substrate (S) and a step for depositing a target constituent material by sputtering are repeated, thereby forming a film with a lower refractive index than that of a film-forming material.

Description

technical field [0001] The present invention relates to a film-forming method with a low refractive index. Background technique [0002] CCDs and CMOSs ​​used as imaging elements reflect light on the surface more strongly than silver salt films, so flare and ghosting are more likely to occur. In addition, in the case of a lens with a small radius of curvature, since the incident angle of light rays varies greatly depending on the position, low reflectance cannot be maintained at a portion where the lens surface is greatly inclined. In addition, in flat-panel displays such as LCDs, reflection glare of external light caused by light reflection on the display surface becomes a problem, so anti-glare treatment is implemented. Anti-glare-treated surfaces suffer from diffuse reflection, which prevents image resolution from improving. In order to reduce the reflection on the surface of such a substrate, it is necessary to form a surface layer with a low refractive index (Non-Pate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/22
CPCC23C14/08C23C14/34C23C14/24C23C14/0021C23C14/0694C23C14/505C23C14/542G02B1/115C23C14/10C23C14/56C23C14/54
Inventor 室谷裕志堀口由纪夫菅原卓哉
Owner TOKAI UNIV
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