A kind of exposure equipment and exposure system

A technology of equipment and abutment, which is applied in the direction of microlithography exposure equipment, photomechanical equipment, and photolithography process exposure equipment, etc., which can solve the problems of bending deformation of the mask plate, uneven distribution of ultraviolet rays, and poor uniformity of line width of exposed products, etc. , to achieve the effect of improving line width uniformity
CN110320761BActive Publication Date: 2022-01-11BOE TECH GRP CO LTD +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
BOE TECH GRP CO LTD
Publication Date
2022-01-11

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Abstract

The invention discloses an exposure device and an exposure system. The exposure equipment includes a pedestal and a base platform located above the base for carrying the substrate, and it is characterized in that the exposure equipment further includes a base set between the base and the base platform for adjusting the base Curvature or / and temperature adjustment of the table. In this exposure equipment, the curvature or / and temperature of the base platform can be adjusted through the adjustment device, so that the curvature of the surface of the base platform is consistent with the bending deformation of the mask plate, so that the curvature of the substrate to be exposed will also be consistent with the curvature of the mask plate The deformation phase is consistent, so that the gap between the lower surface of the mask plate at different positions and the upper surface of the substrate is consistent; or / and, the temperature at different positions of the base can be adjusted through the adjustment device, so that the temperature at different positions of the substrate remains consistent, thereby improving exposure Linewidth uniformity at different locations on the substrate.
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Description

technical field

[0001] The invention relates to the field of display technology, in particular to an exposure device and an exposure system. Background technique

[0002] In the manufacturing process of the display panel, a mask exposure process is often required. figure 1 It is a schematic diagram of the optical path of the proximity exposure equipment. In the actual mask exposure process, such as in proximity exposure equipment, such as figure 1 As shown, the illuminance distribution of the ultraviolet light projected on the equipment base from the high-pressure mercury lamp is uneven, and with the prolongation of the high-pressure mercury lamp, the illuminance distribution of the ultraviolet light projected on the equipment base also changes with time , resulting in a large difference in line width at different positions of the exposed product, and poor line width uniformity.

[0003] In addition, in the mask exposure process, the bending deformation of the mask plate ...

Claims

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