Anti-corrosion agent composition

A technology of composition and resist, which is applied in the direction of optics, optomechanical equipment, instruments, etc., can solve the problem of residual film rate, line width uniformity, decreased adhesion of resist film, insufficient, resist formation characteristics and Insufficient properties such as solubility, etc., achieve the effect of reducing the amount of residual solvents, improving stability, and high safety
CN1782877AInactive Publication Date: 2006-06-07DAICEL CHEM IND LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
DAICEL CHEM IND LTD
Publication Date
2006-06-07
Estimated Expiration
Not applicable · inactive patent

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Abstract

The present invention provides a resist composition which can not only improve the solubility when preparing a resist and the adhesiveness of a resist film during development, but also have improved resist stability and excellent safety , which is a resist composition containing a resist component and an organic solvent selected from the group containing dipropylene glycol monoalkyl ether, dipropylene glycol alkyl ether acetate, etc. 1 kind of dipropylene glycol derivative, and the following formula (1)~(4) of this dipropylene glycol derivative (in the formula, R1 represents an alkyl group or an aryl group, R2 represents a hydrogen atom, an alkyl group, an aromatic group group, acetyl group or propionyl group, R2 represents acetyl group or propionyl group), the content rate of the structural isomer represented by formula (1) in the structural isomer represented by formula (1) is 30% by weight or more and less than 100% by weight % mixture of structural isomers.
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Description

technical field

[0001] The present invention relates to a resist composition sensitive to particle beams such as ultraviolet rays, far ultraviolet rays, X-rays, and electron beams, and relates to excellent safety during use, coatability, residual film rate during development, and pattern after development. A resist composition excellent in line uniformity and also excellent in adhesion during development. Background technique

[0002] In the manufacture of integrated circuits, color filters, liquid crystal elements, etc., microfabrication is required, but in order to meet this requirement, resists have been used conventionally. Generally, there are positive type and negative type resists, and either type is usually a resist composition dissolved in a solvent to make a solution state.

[0003] The resist composition is coated on substrates such as silicon substrates and glass substrates by known coating methods such as spin coating and roll coating, and then prebaked to form...

Claims

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