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Anti-corrosion agent composition

A technology of composition and resist, which is applied in the direction of optics, optomechanical equipment, instruments, etc., can solve the problem of residual film rate, line width uniformity, decreased adhesion of resist film, insufficient, resist formation characteristics and Insufficient properties such as solubility, etc., achieve the effect of reducing the amount of residual solvents, improving stability, and high safety

Inactive Publication Date: 2006-06-07
DAICEL CHEM IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these solvents, which are safer than ethylene glycol monoethyl ether acetate, have insufficient properties such as resist formation properties and solubility.
For example, when propylene glycol monomethyl ether acetate is used, since the amount of residual solvent in the film when the resist is coated on the substrate and formed into a film is large, the residual film rate, uniformity of line width, and resist film during development Adhesion, etc. decreased
[0006] In addition, the technology of improving resin solubility and initiator solubility by using β-type propylene glycol monomethyl ether acetate is disclosed, but at the point of resin solubility and initiator solubility, it is not enough (for example, Patent Document 2 )

Method used

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  • Anti-corrosion agent composition
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  • Anti-corrosion agent composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～10、 comparative example 1～5

[0073] 2 g of the esterification reaction product of 1 mole of 2,4,4,4'-tetrahydroxybenzophenone and 3 moles of naphthoquinone-1,2-diazido-5-sulfonyl chloride and cresol novolak resin 8 g was dissolved in 40 g of solvents (numbers are weight ratios) of the composition shown in Table 1 to prepare a coating liquid of a positive photoresist composition. Table 1 shows the results of the following evaluation tests (1) to (3) performed on the coating liquid thus obtained.

[0074] (1) Whether there are precipitates

[0075] The prepared coating solution was filtered with a 0.2 μm membrane filter, and left to stand at 40° C., and the presence or absence of precipitates in the coating solution after 1 month and 2 months was investigated.

[0076] (2) Sensitivity change

[0077] Whether or not the sensitivity of the photoresist composition changed after 3 months was investigated. That is, when the coating liquid immediately after preparation is applied to the base material and dried...

Embodiment 11～14、 comparative example 6～7

[0099] Copolymerization of monohydroxyadamantyl acrylate and tetrahydropyranyl methacrylate to obtain 70 mol% of monohydroxyadamantyl acrylate units and 30 mol% of tetrahydropyranyl methacrylate units. Copolymerization of weight average molecular weight 8000 things. To the obtained resin, a solvent having a composition described in Table 2 was added to make the solid content 25% by weight, and heated at 50° C. for 10 minutes to examine the dissolution rate (solubility) of the resin. The results are shown in Table 2. The abbreviations in the table are the same as above.

[0100] ○: Becomes a homogeneous transparent solution

[0101] ×: Granular insoluble resin remains on the wall of the vessel

[0102] Solvent (mixing weight ratio)

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Abstract

The present invention provides a resist composition which can not only improve the solubility when preparing a resist and the adhesiveness of a resist film during development, but also have improved resist stability and excellent safety , which is a resist composition containing a resist component and an organic solvent selected from the group containing dipropylene glycol monoalkyl ether, dipropylene glycol alkyl ether acetate, etc. 1 kind of dipropylene glycol derivative, and the following formula (1)~(4) of this dipropylene glycol derivative (in the formula, R1 represents an alkyl group or an aryl group, R2 represents a hydrogen atom, an alkyl group, an aromatic group group, acetyl group or propionyl group, R2 represents acetyl group or propionyl group), the content rate of the structural isomer represented by formula (1) in the structural isomer represented by formula (1) is 30% by weight or more and less than 100% by weight % mixture of structural isomers.

Description

technical field [0001] The present invention relates to a resist composition sensitive to particle beams such as ultraviolet rays, far ultraviolet rays, X-rays, and electron beams, and relates to excellent safety during use, coatability, residual film rate during development, and pattern after development. A resist composition excellent in line uniformity and also excellent in adhesion during development. Background technique [0002] In the manufacture of integrated circuits, color filters, liquid crystal elements, etc., microfabrication is required, but in order to meet this requirement, resists have been used conventionally. Generally, there are positive type and negative type resists, and either type is usually a resist composition dissolved in a solvent to make a solution state. [0003] The resist composition is coated on substrates such as silicon substrates and glass substrates by known coating methods such as spin coating and roll coating, and then prebaked to form...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/039G03F7/00
Inventor 牧泽克宪片山彻
Owner DAICEL CHEM IND LTD
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