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Vacuum pump, blade component and rotor for use in vacuum pump, and fixed blade

A vacuum pump and vane technology, which is applied to the components, pump elements, pumps, etc. of the pumping device for elastic fluid, can solve the problems of burrs, increased processing costs, and the curvature of the convex arc surface becomes larger, and can prevent backflow. , the effect of preventing pollution

Active Publication Date: 2019-10-25
EDWARDS JAPAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, according to such a structure, since the angle formed by the surface of the upper end 7A of the rotary blade 7 and the surface (chamfered surface) of the chamfered portion MS is an acute angle, burrs caused by machining are likely to occur, and the processing cost increases. The bluntness of the machined edge produced during machining and the increase in the curvature of the convex arc surface caused by the aforementioned plating have the opposite effect of increasing the proportion of particles that flow back.

Method used

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  • Vacuum pump, blade component and rotor for use in vacuum pump, and fixed blade
  • Vacuum pump, blade component and rotor for use in vacuum pump, and fixed blade
  • Vacuum pump, blade component and rotor for use in vacuum pump, and fixed blade

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Embodiment Construction

[0066] Hereinafter, the best mode for carrying out the present invention will be described in detail with reference to the drawings. In the present embodiment, as an example of a vacuum pump, a so-called composite wing type turbomolecular pump including a turbomolecular pump portion composed of a plurality of exhaust layers and a screw groove exhaust layer is used as an exhaust mechanism. In addition, the present embodiment can also be applied to a pump having only a turbomolecular pump unit.

[0067] figure 1 It is a cross-sectional view of the vacuum pump to which the present invention is applied.

[0068] If refer to figure 1 , The vacuum pump P1 in the figure includes an outer casing 1 having a cylindrical cross-section, a rotor 6 arranged in the outer casing 1, a support mechanism that rotatably supports the rotor 6, and a drive mechanism that rotationally drives the rotor 6.

[0069] The outer casing 1 has a bottomed cylindrical shape that integrally connects a cylindrical p...

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Abstract

Provided is: a vacuum pump that can effectively prevent backflow of particles from the vacuum pump to a vacuum chamber, without the gas molecule exhaust performance of the vacuum pump being impaired,and that is ideal for preventing contamination of the inside of the vacuum chamber by backflow particles; a blade component and a rotor for use in the vacuum pump; and a fixed blade. A vacuum pump has, between an intake port and an exhaust port, a plurality of exhaust stages PT that function as means for expelling gas molecules. Between the intake port and an uppermost exhaust stage PT (PT1) of the plurality of exhaust stages PT, the vacuum pump has, as particle transport means that transport particles in the direction in which the gas molecules are expelled, blades NB that: rotate with rotaryblades 7 (71, 75) that constitute the uppermost exhaust stage PT1; and number fewer than the rotary blades 7 that constitute the uppermost exhaust stage PT1.

Description

Technical field [0001] The present invention relates to a vacuum pump used as a gas discharge mechanism of a processing chamber of a semiconductor manufacturing device, a flat panel display manufacturing device, a solar panel manufacturing device, and other vacuum chambers. It is particularly suitable for effectively removing gas molecules of the vacuum pump without compromising the performance of the vacuum pump. A vacuum pump that prevents backflow of particles (particles) from the vacuum pump to the cavity to prevent contamination of the cavity caused by the backflowing particles. Background technique [0002] Vacuum pumps such as turbomolecular pumps and threaded trough pumps are mostly used for exhausting vacuum chambers that require high vacuum. Figure 18 It is a schematic diagram of an exhaust system using a conventional vacuum pump as the gas exhaust mechanism of the vacuum chamber. Figure 19 (a) is to Figure 18 The top exhaust layer of the conventional vacuum pump shown ...

Claims

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Application Information

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IPC IPC(8): F04D19/04
CPCF04D19/042F04D29/324F05D2240/303F04D29/701F05D2220/3217F05D2240/306F05D2250/70F05D2260/607F05D2210/12F04D19/04F05B2240/30
Inventor 野中学江野泽秀树
Owner EDWARDS JAPAN
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