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A kind of wet etching equipment with movable cover plate and wet etching method

A movable cover and wet etching technology, which is applied to electrical components, conveyor objects, transportation and packaging, etc., can solve the problems of complex transmission mechanism, uneven etching of workpieces, and heavy maintenance workload

Active Publication Date: 2021-03-23
JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The workpiece is continuously fed, etched, and discharged, and the concentration of each component in the etching solution changes, that is, there is a difference between the concentration of the etching solution dripped on the cover plate and the concentration of the etching solution actually sprayed on the surface of the workpiece, which is easy to Lead to uneven etching of the workpiece
The traditional treatment method includes regular maintenance, rinsing the cover plate of the etching tank and wiping it with a dust-free cloth. The disadvantages of the above-mentioned traditional method are: first, the maintenance workload is large; second, the etching solution usually has strong acid, strong alkali or strong oxidation. Special attention should be paid to safety during maintenance work
The transmission mechanism in the above improvement scheme is complicated, and the cleaning workload of indium oxalate crystals is heavy

Method used

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  • A kind of wet etching equipment with movable cover plate and wet etching method
  • A kind of wet etching equipment with movable cover plate and wet etching method
  • A kind of wet etching equipment with movable cover plate and wet etching method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] Such as Figure 1-2 As shown, the wet etching equipment with a movable cover in embodiment 1 includes an etching box 1, and the inner cavity of the etching box 1 is sequentially provided with a workpiece conveying assembly 2, a spray assembly 3, and the spray assembly 3 and the etching A movable cover assembly 4 is arranged between the top surface of the casing 1, and the movable cover assembly 4 includes two parallel conveying rollers 41, a conveying belt 42 arranged outside the conveying roller 41 under tension, positioned outside the etching casing 1 and connected to the conveying roller. The roller rotation drive member 43 that roller 41 is connected, the array are distributed in several through holes 44 on the conveyer belt 42 and are positioned at conveyer belt 42 below and the flat shape blowing nozzle 45 that is arranged along conveyer belt 42 belt width directions, the flat shape blowing nozzle 45 The angle between the air outlet direction and the conveying dir...

Embodiment 2

[0053] Such as Figure 3-5 As shown, Embodiment 2 is based on Embodiment 1, and there are two points of difference, the first lies in the air source, and the second lies in the specific structure of the conveyor belt 42 .

[0054] The wet etching equipment with a movable cover plate also includes a corrosion-resistant fan 5, the air outlet of the corrosion-resistant fan 5 communicates with the air outlet of the corrosion-resistant fan 45 and the flat air knife 46, and the air inlet of the corrosion-resistant fan 5 communicates with the air outlet of the corrosion-resistant fan. The inner cavity of the etching box 1 is communicated.

[0055] Conveyor belt 42 is a polytetrafluoroethylene sheet, and the outer surface of conveyer belt 42 is provided with groove a, and groove a is connected with the aperture of through hole 44, and the extending direction of groove a extends with the belt length of conveyer belt 42 The same direction.

[0056] The central axis of the through hole...

Embodiment 3

[0061] Such as Image 6 As shown, embodiment 3 is based on embodiment 2, and the difference is that the etching solution that guides and falls on the conveyor belt in embodiments 1 and 2 directly drops into the etching box 1, while in embodiment 3, the above-mentioned etching solution is recovered, The specific recovery structure is as follows: the side wall of the etching box 1 is sealed with an inclined drainage strip 6, the drainage strip 6 is combined with the side wall of the etching box 1 to form an open drainage groove 7, and one side of the conveyor belt 42 Cooperate with the sidewall gap of the etching box body 1, the drainage groove 7 is correspondingly arranged on the conveyor belt 42 below the gap of the side wall of the etching box body 1, and the side wall of the etching box body 1 is also provided with a liquid outlet 8, and the liquid outlet The port 8 communicates with the etching solution storage tank 9 outside the etching box 1 .

[0062] As an equivalent a...

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Abstract

The invention discloses a wet etching equipment with a movable cover plate. The equipment comprises an etching box body. An inner cavity of the etching box body is successively provided with a workpiece transmission component and a spray component from bottom to top. A movable cover plate component is arranged between the spray component and a top surface of the etching box body. The movable coverplate component includes two parallel conveying rollers, a conveying belt arranged outside the conveying rollers in a tensioning mode, a roller rotation driving component located outside the etchingbox body and connected to the conveying rollers, several through holes distributed on the conveying belt in an array mode, and a flat blowing nozzle located below the conveying belt and arranged alonga conveying belt width direction. An included angle between a wind outlet direction of the flat blowing nozzle and a conveying direction of the conveying belt is 95-120 DEG C. There is a height difference between two ends of each conveying roller, and / or a flat air knife is arranged between conveying belt layers located at top and bottom ends of the conveying rollers. An air outlet of the flatair knife is inclined downwardly and faces towards the conveying belt. Through the conveying belt and the flat blowing nozzle, a problem of uneven etching caused by a difference in concentration of anetching solution which is dropped and sprayed to an etching surface of a workpiece is improved.

Description

technical field [0001] The invention relates to the technical field of wet etching equipment, in particular to a wet etching equipment with a movable cover and a wet etching method. Background technique [0002] Wet etching is an etching method in which the etched substance is stripped off through the chemical reaction between the chemical etching solution and the etched substance. Most wet etches are isotropic etches that are not easily controlled. Wet etching is characterized by strong adaptability, good surface uniformity, and less damage to silicon wafers. It is suitable for almost all metals, glass, plastics and other materials. [0003] The wet etching process is widely used in the production of liquid crystal display panels. The etching solution used for wet etching usually falls on the etching surface of the workpiece by sputtering, liquefaction, atomization, etc., and the etching solution inevitably adheres to the cover plate of the etching equipment. . The workp...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67H01L21/677
CPCH01L21/6708H01L21/67742
Inventor 顾玲燕朱龙任奕宇李翔承明忠
Owner JIANGYIN JIANGHUA MICROELECTRONICS MATERIAL