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Method for evaluating uniformity of pyramid texture on surface of monocrystalline silicon cell

A monocrystalline silicon cell, pyramid technology, applied in the field of solar cells

Inactive Publication Date: 2019-11-29
JIMEI UNIV
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Problems solved by technology

[0007] The purpose of the present invention is to provide a method for evaluating the uniformity of pyramidal texture on the surface of monocrystalline silicon cells in view of the shortcomings of existing quantitative characterization methods, which can provide an evaluation basis for optimizing the texturing process and monitoring the texturing effect, and then realize crystalline silicon. The high photoelectric conversion efficiency of the battery provides a solution

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  • Method for evaluating uniformity of pyramid texture on surface of monocrystalline silicon cell
  • Method for evaluating uniformity of pyramid texture on surface of monocrystalline silicon cell
  • Method for evaluating uniformity of pyramid texture on surface of monocrystalline silicon cell

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[0029] The above objects, features and advantages of the present invention will become more apparent by describing the present invention in more detail with reference to the accompanying drawings. The accompanying drawings are used to provide a further understanding of this embodiment and constitute a part of the description, but do not limit the application.

[0030] Such as figure 1 As shown, according to the different etching times of monocrystalline silicon chemical texturing, there are three typical texture types of surface pyramid texture. In the early stage of etching, small pyramids are gradually exposed on the surface of monocrystalline silicon wafers. At this stage, the surface is not covered with pyramids, and the texture poor uniformity, such as figure 1 As shown in (a); when the etching time is moderate, the surface of monocrystalline silicon is covered with pyramids, and the texture uniformity becomes better, as shown in figure 1 As shown in (b); as the etching...

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Abstract

The invention discloses a method for evaluating the uniformity of a pyramid texture on the surface of a monocrystalline silicon cell. The method comprises the following steps: A, acquiring the heightsof all pyramids of the texture in a sampling area of a monocrystalline silicon cell by means of image processing; B, ranking and normalizing the heights Hi of all the pyramids of the texture to obtain a unit height hi; C, calculating the surface material rate Smr(c) curve of an ideal uniform pyramid texture; D, calculating the surface material rate Smr(c) curve of any non-uniform pyramid texture;and E, calculating the value of a uniformity coefficient ku according to the Smr (c) curve of any pyramid texture. By adopting the method, the texturing quality can be judged according to the uniformity coefficient of the surface texture of a textured monocrystalline silicon wafer, the texturing process can be optimized and controlled, the optimal texturing time node, the optimal texturing solution ratio and the optimal texturing solution component can be obtained, and a feasible basis is thus provided for obtaining a monocrystalline silicon cell with high photoelectric conversion efficiency.

Description

technical field [0001] The invention relates to the technical field of solar cells, in particular to a method for evaluating the uniformity of the pyramidal texture on the surface of a monocrystalline silicon cell. Background technique [0002] At present, crystalline silicon cells account for about 90% of the global photovoltaic market share. Monocrystalline silicon solar cells are the most mature technology among silicon-based solar cells. Due to their advantages of high conversion efficiency and stable performance, they are widely used in large-scale applications and industrial production. How to reduce the surface reflection loss of monocrystalline silicon cells while enhancing their photovoltaic effect is a research hotspot in the field of solar cells. [0003] A large number of studies have shown that the best way to achieve high-efficiency absorption of sunlight is to prepare a light trap microstructure (that is, a pyramid texture) on the surface of single crystal sil...

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Application Information

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IPC IPC(8): H01L21/66G01N23/2251
CPCG01N23/2251G01N2223/09G01N2223/102G01N2223/401G01N2223/604H01L22/12
Inventor 许志龙杨小璠刘菊东方芳王素沈志煌姜涛
Owner JIMEI UNIV