a hexagonal column 3 /bi 2 the w 6 Preparation method of composite photoelectrode thin film
An electrode film and composite light technology, applied in electrodes, electrolysis components, electrolysis process, etc., can solve the problem of no hexagonal column shape, and achieve the effects of good light stability, uniform distribution, and good photoelectric catalytic water oxidation activity.
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Embodiment 1
[0016] A hexagonal column type WO 3 / Bi 2 WO 6 The preparation method of the composite photoelectrode film, the specific steps are as follows:
[0017] At room temperature, prepare 15ml sodium tungstate with a concentration of 25mmol / L and ammonium oxalate solution with a concentration of 55mmol / L respectively, and slowly add 5ml of hydrochloric acid solution (3mol / L) to the sodium tungstate solution and stir evenly. Mix with ammonium oxalate solution and stir for 30 minutes; then transfer the mixed solution to a hydrothermal reactor, insert FTO conductive glass, and place it in a constant temperature blast drying oven at 140°C for 6 hours. After cooling, wash with water, dry, and calcine at 550°C. 2.5h, get WO 3 Electrode: Cut the electrode into small pieces of 1cm×2.5cm, add 150μL of bismuth nitrate aqueous acetic acid solution with a concentration of 0.1mmol / L, dry at room temperature, calcine at 550°C for 6h, after cooling, use 0.5mol / l HNO 3 Soak for 15h to remove Bi on the s...
Embodiment 2
[0020] A hexagonal column type WO 3 / Bi 2 WO 6 Preparation method of composite photoelectrode film, WO 3 The preparation steps of the film are the same as in Example 1, and the WO is prepared 3 After the membrane electrode, prepare 50ml of a 0.1mmol / L bismuth nitrate aqueous solution, and add concentrated acetic acid to adjust the pH to 0.6. After that, pipette 100μL of this solution to WO 3 The surface of the film electrode, dried at room temperature, calcined at 650℃ for 6h, after cooling, use 0.8mol / L HNO 3 Soak for 15h to remove Bi on the surface 2 O 3 Get WO 3 / Bi 2 WO 6 film.
[0021] figure 2 For the prepared WO 3 And WO 3 / Bi 2 WO 6 The ultraviolet-visible diffuse reflectance of the thin-film electrode shows that as the wavelength decreases, the WO 3 And WO 3 / Bi 2 WO 6 The absorbance of the film electrode gradually increases, WO 3 The band-edge absorption is at 470nm, while WO 3 / Bi 2 WO 6 The absorption of thin-film electrodes in the visible light region increases becaus...
Embodiment 3
[0023] A hexagonal column type WO 3 / Bi 2 WO 6 Preparation method of composite photoelectrode film, WO 3 The preparation steps of the film are the same as in Example 1, and the WO is prepared 3 After the membrane electrode, prepare 50ml of bismuth nitrate aqueous solution with a concentration of 0.02mmol / L, and add concentrated acetic acid to adjust the pH to 0.5. After that, pipette 200μL of this solution to WO 3 The surface of the film electrode, dried at room temperature, calcined at 600℃ for 4h, after cooling, use 0.5mol / l HNO 3 Soak for 15h to remove Bi on the surface 2 O 3 Get WO 3 / Bi 2 WO 6 film.
[0024] image 3 For WO 3 And WO 3 / Bi 2 WO 6 The linear scanning volt-ampere curve of the film electrode, the scanning speed is 20mV / s, and the output intensity of the xenon light source is adjusted to 100mW / cm 2 , The supporting electrolyte is a sodium phosphate buffer solution with a pH of 7 and a concentration of 0.1 mol / L. Under this condition, as the applied potential gradu...
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