Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Vertical magnetron sputtering coating device for long outer cladding tube

A magnetron sputtering coating, cladding tube technology, applied in sputtering coating, ion implantation coating, vacuum evaporation coating and other directions, to achieve the effect of improving processing efficiency, ensuring uniformity and flexible rotation

Active Publication Date: 2019-12-20
苏州思萃材料表面应用技术研究所有限公司
View PDF6 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the existing magnetron sputtering technology, there is no equipment that can use the method of magnetron sputtering to coat zirconium alloy tubes with a length of 4 meters or more at one time.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vertical magnetron sputtering coating device for long outer cladding tube
  • Vertical magnetron sputtering coating device for long outer cladding tube
  • Vertical magnetron sputtering coating device for long outer cladding tube

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] The present invention will be further explained below in conjunction with the drawings.

[0028] The present invention provides a vertical magnetron sputtering coating device for a long outer shell tube. The device is based on a cylindrical shell, which is the cavity 10, which is composed of three layers and has a hard protective outer shell. A metal layer, an insulating middle ceramic layer, and an inner metal layer that closes the magnetic lines of force and blocks energy-rich particles; the cavity 10 is directly above the cavity door 110; the cavity 10 is embedded with an observation window in the middle cavity On the door; a total of 3 pairs of target base chassis 20 are installed symmetrically on the inner metal surface of the cavity 10, each target base chassis 20 has 6 symmetrically distributed target bases 210, and each target base 210 is equipped with a cylindrical metal Target. The standard tooling size of the target material is Φ1.5m×5m. The metal target materi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
heightaaaaaaaaaa
Login to View More

Abstract

The invention discloses a vertical magnetron sputtering coating device for a long outer cladding tube. The device comprises a shell, wherein the shell is provided with a cylindrical cavity with an opening at the top, a rotating device connected with a transmission device outside the shell is arranged at the bottom in the cavity, and a workpiece frame is arranged on the rotating device; a pluralityof pairs of target seat bottom discs are installed on the inner wall of the cavity along the axial direction thereof, a plurality of target seats are distributed on each target seat bottom disc, thetarget seats are used for installing metal target materials, a cavity door used for replacing the metal target materials is arranged beside each pair of target seat bottom discs, and shielding platesare arranged on the target seats; and an air inlet and outlet device and a high-pressure air outlet are formed in the top of the cavity, and during work, the metal target materials are connected witha negative electrode of an external circuit through seat electrodes, and the workpiece frame is connected with a positive electrode of the external circuit through the seat electrodes. According to the device, the structure is simple, the operation is convenient, a deposited film is uniform, when the target materials are subjected to magnetron sputtering, the atomic deposition rate of a cladding material is guaranteed due to the constraint of magnetic lines of force, raw materials are saved, and the production efficiency and the finished product quality are improved.

Description

Technical field [0001] The invention belongs to the field of magnetron sputtering coating, and in particular relates to a vertical magnetron sputtering coating device for a long outer envelope tube. Background technique [0002] At present, the world's demand for clean energy is increasing, and nuclear power has the advantages of green environmental protection and huge production capacity. At the same time, as a high-radiation industry, its safety issues cannot be underestimated. The high-temperature water vapor that drives the generator is discharged through a pressure tube made of zirconium alloy as the main material. The neutron absorption cross-section of pure zirconium is very low, but because its strength and corrosion resistance cannot meet the requirements of manufacturing pressure tubes, people often add some alloying elements to zirconium to improve its mechanical properties and corrosion resistance without increasing significantly. Where the sub-absorption cross-secti...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/35C23C14/50
CPCC23C14/352C23C14/505
Inventor 宋忠孝张娜关博远李雁淮朱晓东孙军
Owner 苏州思萃材料表面应用技术研究所有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products