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Quantum dot light-emitting device patterning method and quantum dot light-emitting device

A quantum dot light-emitting and patterning technology, which is applied in semiconductor devices, electric solid devices, organic semiconductor devices, etc., can solve the problems of slow speed and complicated process, and achieve the effect of reducing printing process and saving printing time

Active Publication Date: 2020-01-17
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] An embodiment of the present invention provides a method for patterning a quantum dot light-emitting device, which avoids the problems of slow speed and complicated process caused by printing, transfer printing and other processes in the general method for patterning a quantum dot light-emitting device in the prior art. Reduced printing process, thus saving printing time

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  • Quantum dot light-emitting device patterning method and quantum dot light-emitting device
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  • Quantum dot light-emitting device patterning method and quantum dot light-emitting device

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Embodiment Construction

[0044] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present invention.

[0045] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " The orientation or positional relationship indicated by "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. is based on the orientation shown in the drawings Or positional relationship is only for the convenience of describing the present invention and simpl...

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Abstract

The embodiment of the invention discloses a quantum dot light-emitting device patterning method and a quantum dot light-emitting device. According to the embodiment of the invention, the method comprises the steps of providing a printing screen with a preset pattern; aligning the printing screen with a first mark preset on a first substrate; printing a quantum dot material on the printing screen to form a first quantum dot layer with the preset pattern on the first substrate; and curing the first quantum dot layer to obtain a second substrate. By printing the quantum dot material through the printing screen, the problems of low speed, complex process and the like caused by using printing, transfer printing and other processes in a common quantum dot light-emitting device patterning methodin the prior art are avoided, the printing process is reduced, and the printing time is saved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a quantum dot light-emitting device patterning method and a quantum dot light-emitting device. Background technique [0002] Quantum dot light-emitting devices have received extensive attention because of their advantages such as wide color gamut, low-cost solution preparation, adjustable emission spectrum, and good stability under light. OLED) light-emitting devices have comparable display performance and have the advantage of lower manufacturing costs. Therefore, quantum dot light-emitting devices are likely to replace OLED light-emitting devices and become the next generation of core display devices. [0003] In the manufacturing process of quantum dot light-emitting devices, patterning of quantum dot light-emitting devices is one of the key processes. At present, the patterning of quantum dot light-emitting devices is generally realized by printing or transfer printing proc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/50H01L27/32H01L51/56
CPCH01L33/505H01L2933/0041H10K59/38H01L33/502H01L25/0753H01L25/167H01L33/504H10K2102/331H01L33/005H01L33/60H01L2933/0058
Inventor 樊勇
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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