The invention relates to a preparation method of a
cell, in particular to a preparation method of an MWT
solar cell, and belongs to the technical field of MWT
solar cell module
processing. The preparation method of the MWT
solar cell comprises the steps: performing
punching, texturing and
diffusion of a
silicon wafer, and then performing
etching, oxidation annealing, back
passivation, front
coating,
laser grooving, silk-
screen printing and
sintering to form
ohmic contact; and finally obtaining the MWT solar
cell. The
etching step comprises the substeps: removing phosphorosilicate glass on theback surface and four side surfaces of the
silicon wafer, and then adding reaction solution for alkali
polishing to obtain the back surface with the
reflectivity of 40-50%. Compared with an
acid etching process, the groove type alkali
polishing process has the advantages that the back
polishing effect of the
silicon wafer is more excellent, the weight is reduced, and the fragment risk is reduced;the back
reflectivity is higher, the internal reflection effect of a long
wave band is improved, uniform deposition of a
passivation film Al2O3 is facilitated, the
passivation effect on a silicon wafer is improved, and the battery efficiency
gain is at least 0.15% compared with the prior art.