Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Method and device for measuring ion beam eccentric angle of Hall ion source

A Hall ion source and eccentricity angle technology, applied in the field of image processing, can solve the problem of difficulty in measuring the eccentricity angle of the ion beam, and achieve the effect of rapid measurement and evaluation

Pending Publication Date: 2020-02-04
哈工大机器人(岳阳)军民融合研究院
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the above-mentioned defects in the prior art, the present invention provides a method and device for measuring the eccentric angle of the ion beam of the Hall ion source, which effectively solves the problem that the eccentric angle of the ion beam is difficult to measure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and device for measuring ion beam eccentric angle of Hall ion source
  • Method and device for measuring ion beam eccentric angle of Hall ion source
  • Method and device for measuring ion beam eccentric angle of Hall ion source

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0032] In order to make the objectives, technical solutions, and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and preferred embodiments. However, it should be noted that many details listed in the specification are only to enable the reader to have a thorough understanding of one or more aspects of the present invention, and these aspects of the present invention can be implemented even without these specific details.

[0033] This embodiment provides a method for measuring the eccentric angle of the ion beam of the Hall ion source. The schematic diagram is as follows: figure 1 As shown, by using a photo of the circumferential discharge channel of the Hall ion source taken by a CCD camera, the photo is imported into MATLAB for processing and converted into a photo matrix format; MATLAB calculates the pixel value distribution in the photo image and calculates the ion beam The...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method and device for measuring the ion beam eccentric angle of a Hall ion source, and the method comprises the steps: importing a picture, photographed by a CCD camera, of acircumferential discharge channel when the Hall ion source works into MATLAB for processing, and converting the picture into a picture matrix format; and calculating pixel value distribution in the photo image by MATLAB, and calculating an ion beam current vector eccentric angle. According to the invention, the problem that the eccentric angle of the ion beam is difficult to measure is effectively solved.

Description

Technical field [0001] The invention relates to the technical field of image processing, in particular to a method and a device for measuring the eccentric angle of the ion beam of a Hall ion source. Background technique [0002] The Hall ion source is a device that ionizes neutral atoms or molecules and draws an ion beam from it. The Hall ion source ionizes the gas charged into the vacuum chamber by using the emitted electrons under the interaction of the electric field and the magnetic field in a vacuum environment, and emits ions under the action of the electric field and the magnetic field. As a gridless ion source, the Hall ion source is widely used in general auxiliary coating fields because of its low maintenance cost. The luminescence of the beam in the ion source channel can reflect the distribution of ions generated by the collision in the channel. When working under ideal axial symmetry, the ion beam direction should coincide with the ion source axis. However, due t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06T7/60G01T1/29
CPCG06T7/60G01T1/2907
Inventor 魏立秋丁永杰唐井峰李文博杨鑫勇吕游
Owner 哈工大机器人(岳阳)军民融合研究院
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products