A method for modeling edge removal function and edge effect suppression in magnetorheological polishing

A magnetorheological polishing and edge effect technology, which is applied in grinding/polishing equipment, manufacturing tools, grinding automatic control devices, etc., can solve problems such as low efficiency, low processing accuracy, and poor edge surface shape control

Active Publication Date: 2021-04-13
INST OF MACHINERY MFG TECH CHINA ACAD OF ENG PHYSICS
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is that the defects of the edge removal function compensation method in the existing method for suppressing the edge effect of magnetorheological polishing lead to large shape errors of the edge removal function and poor control of the edge surface shape, resulting in low processing accuracy, The problem of low efficiency, the present invention provides a kind of magneto-rheological polishing edge removal function modeling and edge effect suppression method to solve the above problems

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A method for modeling edge removal function and edge effect suppression in magnetorheological polishing
  • A method for modeling edge removal function and edge effect suppression in magnetorheological polishing
  • A method for modeling edge removal function and edge effect suppression in magnetorheological polishing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0076] The present invention relates to a magnetorheological polishing edge removal function modeling and edge effect suppression method, the method comprising the following steps:

[0077] S1. Under the given magnetorheological polishing satin immersion depth and spot sampling time, collect non-edge polishing spots and polishing spots with different contact distances in the two cases of cutting into the edge and cutting out the edge, so as to obtain non-edge The length and width of the polishing spot;

[0078] S2. According to the length and width of the non-edge polishing spot obtained in step S1, a parameterized model of magnetorheological polishing removal function based on Bezier splines is established;

[0079] S3. Establishing an edge removal function reconstruction method for different contact states, and performing geometric modeling; wherein, the contact state includes two cases of cut-in and cut-out;

[0080] S4. Formulate a dwell time solution strategy based on th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a magnetorheological polishing edge removal function modeling and edge effect suppression method. The method includes the following steps: S1. Under a certain polishing ribbon immersion depth and spot collection time, respectively collect non-edge polishing spots, As well as the polishing spots with different contact distances in the two situations of cutting into the edge and cutting out of the edge, the length and width of the non-edge polishing spots are obtained. S2. Establish a parameterized model of magnetorheological polishing removal function based on Bezier splines; S3. Establish a reconstruction method for edge removal function in different contact states; S4. Develop a dwell time solution strategy based on an edge removal function model. The removal function model designed by the present invention has an analytical form and a high degree of geometric freedom, which solves the problems of large shape errors and poor control of the edge surface shape in the current magneto-rheological polishing edge removal function compensation method, and improves the model of the edge removal function Precision and suppression level of edge effects.

Description

technical field [0001] The invention relates to the technical field of ultra-precision machining of optical elements, in particular to a method for modeling an edge removal function and suppressing edge effects in magneto-rheological polishing. Background technique [0002] Magnetorheological polishing (MRF) has the characteristics of high flexibility, less damage, and strong controllability. It is an ideal polishing method to control the edge effect of optical components. In the magnetorheological process, when the polishing head moves to the edge area of ​​the workpiece, the contact area changes, resulting in distortion of the shape of the removal function, which makes the shape of the edge removal function different from the normal removal function. When the normal removal function is used for processing in the process , the edge shape error will be distorted, this effect is called edge effect. [0003] From the analysis of the mechanism of hydrodynamic pressure, the edg...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B24B1/00B24B51/00
CPCB24B1/005B24B51/00
Inventor 樊炜张云飞黄文刘晓卓周涛田东
Owner INST OF MACHINERY MFG TECH CHINA ACAD OF ENG PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products