Chemical vapor deposition equipment

Abstract

The invention provides chemical vapor deposition equipment. The equipment comprises a reaction cavity, wherein the reaction cavity comprises a plurality of bases used for bearing substrates, the multiple bases are disc-shaped, a process gas enters the reaction cavity through a pipeline, the multiple bases are arranged in parallel with one another, and the center of a circle of each base is on thesame straight line; the upper surfaces, bearing the substrates, of the bases are parallel to one another or on the same plane; the rotating axes of the bases are on the same plane, and the bases are independently rotated relative to one another, and the process gas flows along the upper surfaces of the bases and perpendicular to the line connecting direction of the centers of the circles of the bases.

Description

technical field [0001] The invention relates to the field of chemical vapor deposition, in particular to a chemical vapor deposition equipment. Background technique [0002] Chemical vapor deposition technology (Chemical Vapor Deposition, CVD for short) is a thin film growth technology widely used in the fields of semiconductors and flat panel displays. Vapor deposition techniques have relatively low growth rates. At the same time, due to the high reaction temperature, a large amount of non-metallic graphite, quartz, ceramics and other materials are usually used to make parts of the metal reaction chamber. Limited by the processing technology of such materials, the cost of components in such a reaction chamber is very high, resulting in a relatively high cost of film formation. [0003] In the prior art, one way to solve the production cost of high temperature CVD is to use a multi-piece flat plate structure. On a large disc base, a large number of substrates are placed s...

AI Technical Summary

Problems solved by technology

This method can improve the uniformity of film formation, but there are also significant disadvantages. For example, the air flotation pipeline of the disc base is made of graphite material, the production cost is relatively high, and the rotation speed is difficult to control independently, which makes the repeatability of film formation difficult. reduce

In addition, when the size of the substrate increases, the weight of the substrate and the base of the small disk increases, and it becomes more difficult to realize the air-suspended rotation of the disk, which makes it difficult to use this method for large-sized substrates

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