Photoelectric property detection method for LED crystal grains
A detection method and technology of optoelectronic performance, which are applied in the test/measurement of circuits, electrical components, semiconductor/solid-state devices, etc., can solve the problems such as the difficulty of finding the machine in time, the increase of the total moving distance of the detection mechanism, and the input error of the expansion ratio. Achieve the effect of avoiding poor product consistency control, less monitoring and calibration workload, and shortened moving distance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0030] see Figure 1~2 , the wafer is cut into 4-inch crystal grains, and each grain 1 is provided with a positive electrode 2 and a negative electrode 3, and the photoelectric performance of all the grains is tested. The specific steps are as follows:
[0031] 1) Calibrate all machines with a unified standard sheet, and designate at least one of them as a standard machine, and the rest as working machines. All standard machines set the corresponding expansion ratio parameters according to the size specifications of the product. All working machines The machine does not set the expansion ratio parameter;
[0032] 2) In the non-expanded state, the wafer cut into crystal grains is placed on the working machine for detection, and the detection data is obtained;
[0033] 3) Carry out expansion processing on the wafer, and transfer it to a standard machine for sampling test again to obtain standard data;
[0034] 4) Compare the detection data with the standard data. Compared with...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 

