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Metasurface information multiplexing mask system and preparation method thereof

An information multiplexing and metasurface technology, applied in the field of micro-nano optics and polarization optics, can solve the problems of high cost and limited resolution of cadmium plates, and achieve the effects of cost control, high resolution and simple process

Inactive Publication Date: 2021-05-04
WUHAN UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Limited by the resolution of the cadmium plate, traditional photolithography basically does not use magnification projection, so the cost is very high when making micron-level optical components

Method used

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  • Metasurface information multiplexing mask system and preparation method thereof
  • Metasurface information multiplexing mask system and preparation method thereof
  • Metasurface information multiplexing mask system and preparation method thereof

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Embodiment

[0030] The information multiplexing mask system in the embodiment of the present invention includes a lens and a substrate; an array of titanium dioxide nano-bricks arranged periodically is arranged on the substrate; the nano-bricks are titanium dioxide nano-bricks; the substrate is quartz glass.

[0031] figure 1 -2 shows the titania nano-brick array structure, including two layers, which are titania nano-brick 1 and substrate 2 from top to bottom. Wherein, the titania nano-brick array 1 is composed of titania nano-brick unit structures arranged periodically, and the titania nano-brick is a cuboid, and its length, width and height are all sub-wavelength dimensions. The structure of a single titania nanobrick unit is shown in figure 1 . In this embodiment, the substrate 2 is a silicon dioxide substrate. TiO2 nanobrick arrays can be fabricated on fused silica using electron beam lithography.

[0032] The preparation process of the metasurface multiplexing mask of this embod...

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Abstract

The invention discloses a supersurface information multiplexing mask system and a preparation method thereof. The metasurface information multiplexing mask system of the present invention comprises quartz glass; a nano-brick array structure is formed on one side surface of the quartz glass to modulate the intensity of reflected (or transmitted) light; a lens is used to The metasurface material mask plate is enlarged for imaging; the SOI imaging surface coated with photoresist is used to make an integrated optical circuit. The nano-brick array is formed by periodic arrangement of nano-brick units, and the nano-brick is in the shape of a cuboid, and the length, width and height are all sub-wavelength dimensions. The invention can effectively enlarge the surface pattern of the metasurface material and use it as a mask to make an integrated optical path, and by properly rotating the polarization angle of the incident ray polarization, a metasurface sample can form two different images and thus be used as two masks The utility model has the advantages of small size, low cost, small weight and simple design idea, and is very suitable for application in micro-photoelectric systems.

Description

technical field [0001] The invention belongs to the fields of micro-nano optics and polarization optics, and in particular relates to a metasurface information multiplexing mask system and a preparation method thereof. Background technique [0002] Photolithography technology refers to the technology of transferring the pattern on the mask plate to the substrate by means of photoresist (also known as photoresist) under the action of light. The main process is as follows: first, ultraviolet light is irradiated on the surface of the substrate with a layer of photoresist film through the mask plate, causing the photoresist in the exposed area to undergo a chemical reaction; Photoresist (the former is called positive photoresist, the latter is called negative photoresist), so that the pattern on the mask plate is copied to the photoresist film; finally, the pattern is transferred to the substrate by etching technology. The traditional lithography mask is generally a cadmium pla...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/38
CPCG03F1/38
Inventor 郑国兴李嘉鑫李子乐单欣李仲阳
Owner WUHAN UNIV
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