Double-layer cleansing lotion applying micelle technology

A makeup remover and glue application technology, which is applied in the field of daily chemical products, can solve the problems of skin not breathing, easy clogging of skin pores, dry skin and lack of water, etc., to achieve good makeup and decontamination, prevent water loss, and good solubility Effect

Inactive Publication Date: 2020-04-14
广州蜜妆生物科技有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Looking at the market, makeup remover products have become an indispensable part of skin care, but hydrophilic makeup remover products are weak and incomplete in cleaning makeup, and over-cleaning can easily cause skin dryness and lack of water. Oily makeup remover products Makeup remover will be too greasy, it is easy to clog the skin pores, resulting in oily substances residue, long-term use, the skin can not breathe

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Double-layer cleansing lotion applying micelle technology
  • Double-layer cleansing lotion applying micelle technology
  • Double-layer cleansing lotion applying micelle technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-3

[0034] According to the mass percentage of each raw material in Table 1 and Table 2, the water layer component and the oil layer component of Implementation 1-3 were prepared respectively.

[0035] Table 1:

[0036]

[0037] Table 2:

[0038]

[0039]

[0040] Concrete preparation method of the present invention is as follows:

[0041] 1. Accurately weigh deionized water, decyl glucoside, polysorbate-20, polyethylene glycol-8, 1,3 butanediol, sodium chloride and various water-soluble additives, mix them, and heat to 85 Dissolve evenly at ℃ and drop to room temperature for later use;

[0042] 2. Accurately weigh and mix cyclopentasiloxane, isohexadecane, and various oil-soluble additives, heat to 75°C, dissolve evenly, and cool down to room temperature for later use;

[0043] 3. Fill and pack the prepared water layer and oil layer according to the ratio of 2:1 to obtain product 1, product 2 and product 3.

[0044] The prepared product 1, product 2 and product 3 wer...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a double-layer cleansing lotion applying micelle technology. The double-layer cleansing lotion comprises a water layer and an oil layer. The water layer comprises the followingcomponents (by weight): 0.2-18% of a surfactant, 1-20% of polyethylene glycol-8, 1-30% of 1, 3-butanediol, 0.5-3% of sodium chloride, 1-5% of a water-soluble additive, and the balance of deionized water. The oil layer is composed of the following components (by weight): 10-50% of cyclopentasiloxane, 45-85% of isohexadecane, and 2-18% of an oil-soluble additive. The ratio of the water layer to theoil layer is 2: 1. According to the double-layer cleansing lotion, by optimizing and adjusting the ratio of the oil layer to the water layer and the scientific ratio of the surfactant, the double-layer cleansing lotion which is stable in layering of the oil layer and the water layer, has a good cleansing effect and is refreshing and mild is formed.

Description

technical field [0001] The invention relates to the technical field of daily chemical products, in particular to a double-layer makeup remover using micellar technology. Background technique [0002] With the popularity of various types of makeup, makeup has become an indispensable step in the daily life of modern women. Cleaning and removing makeup after makeup has become an important topic. If the makeup is not removed thoroughly, the residual makeup or absorbed dirt will cause the pores of the facial skin to be clogged, the skin cannot breathe, and it will cause acne and acne And blackheads and other troublesome skin problems, so make-up removal and makeup are equally important for skin care. [0003] Looking at the market, makeup remover products have become an indispensable part of skin care, but hydrophilic makeup remover products are weak and incomplete in cleaning makeup, and over-cleaning can easily cause skin dryness and lack of water. Oily makeup remover products...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/03A61K8/20A61K8/31A61K8/34A61K8/39A61K8/58A61K8/60A61Q1/14A61Q19/00
CPCA61K8/03A61K8/39A61K8/585A61K8/602A61K8/345A61K8/20A61K8/31A61Q1/14A61Q19/00A61K2800/524
Inventor 田贵丰葛先卫
Owner 广州蜜妆生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products