Photoresist stripping system and photoresist stripping method

Abstract

The invention discloses a photoresist stripping system and a photoresist stripping method. The photoresist stripping system sequentially comprises a stripping chamber, a cleaning chamber and a spraying chamber which are connected with one another. A substrate subjected to photoresist stripping in the stripping chamber enters the cleaning chamber; in the cleaning chamber, a water jet cutter cleaning mechanism is adopted to spray water to a substrate to form a uniform water film to cover the surface of a substrate film layer, so the fluidity of residual photoresist on the surface of the substrate film layer is ensured; and a second spraying mechanism is adopted to spray water to the substrate with the uniform water film to clean the residual photoresist and stripping liquid on the substrate.Therefore, the cleaning chamber adopted after the stripping chamber can prevent the problem that residual photoresist and residual stripping liquid discharged from the stripping chamber are cured under the action of air drying and re-attached to the surface of the substrate to cause poor white points during display.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a photoresist stripping system and a photoresist stripping method. Background technique [0002] In the manufacturing process of devices such as liquid crystal displays (LCDs) and organic light emitting diodes (OLEDs), components such as gates, active layers, and light-emitting layers on array substrates are generally prepared by patterning. Taking patterning to form the pattern of the gate as an example, firstly, a metal film is formed on the substrate, and a photoresist is coated on the metal film. Then, the photoresist is exposed and developed, and then the uncovered photoresist is The metal thin film of the adhesive is etched, and finally, the remaining photoresist on the substrate is peeled off to finally obtain the pattern of the gate. [0003] The traditional photoresist stripping technologies mainly include dry stripping, wet stripping and supercritical cleaning. Curren...

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Problems solved by technology

[0008] At present, the above known photoresist treatment processes will cause photoresist residues and organic residues. The main reason is that after the dissolved photoresist polymer molecules are dispersed into the stripping solution, although the drying unit (CDA) will remove the photoresist containing The solution of glue dissolves, but at the same time, the photoresist and organic matter (stripping solution) that have been dissolved in the stripping solution will be cured again under the action of air drying, and reattached to the surface of the substrate film layer, such as figure 2 As shown, the photoresist and organic matter (stripping liquid) deposited on the surface of the substrate film layer will cause poor white spots during display.

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