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Polycrystalline silicon cleaning machine and method for cleaning polycrystalline silicon

A technology of polysilicon and washing machine, applied in the field of solar energy, can solve the problems of secondary pollution of polysilicon materials, achieve the effect of improving product qualification rate and conversion effect, solving secondary pollution, and quick results

Pending Publication Date: 2020-05-15
CHINA SILICON CORP LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polysilicon cleaning machine is not only simple in structure, easy to install, small in investment and quick in effect, but also can effectively solve the problem of secondary pollution of polysilicon materials caused by the contact between acid and air during the pickling process, and ensure the cleaning quality and cleaning effect. Improve product quality and reduce labor intensity

Method used

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  • Polycrystalline silicon cleaning machine and method for cleaning polycrystalline silicon
  • Polycrystalline silicon cleaning machine and method for cleaning polycrystalline silicon
  • Polycrystalline silicon cleaning machine and method for cleaning polycrystalline silicon

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Embodiment Construction

[0029] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0030] The inventors found that in the existing polysilicon washing machine, the polysilicon is picked up by a manipulator after pickling and placed in a quick rinse tank. Since the washing machine is not completely closed and there is air, the polysilicon material after pickling is picked up by a manipulator. Put it into the fast flushing tank, in the inherent time (such as 6s) required for the transfer process, the silicon material exposed to the air will be oxidized, and the cleaning machine can be kept inside the cleaning mach...

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Abstract

The invention discloses a polycrystalline silicon cleaning machine and a method for cleaning polycrystalline silicon. The polycrystalline silicon cleaning machine comprises a body and an inert gas blowing device, a mechanical arm, an acid corrosion groove, a first rapid flushing groove, a second rapid flushing groove and a pure water transition groove are mounted in the body, the acid corrosion groove, the first rapid flushing groove, the second rapid flushing groove and the pure water transition groove are mounted in sequence, the inert gas blowing device comprises a gas conveying pipeline and multiple air knife spraying openings, the gas conveying pipeline extends into the body and extends to the position above the acid corrosion groove and the first rapid flushing groove, the air knifespraying openings are formed in the gas conveying pipeline and are distributed at intervals in the direction of the gas conveying pipeline, and the air knife spraying openings independently face the acid corrosion groove area and the first rapid flushing groove areas. The polycrystalline silicon cleaning machine is simple in structure, convenient to mount, small in investment, rapid in effect taking. The secondary pollution to polycrystalline silicon materials due to contact of acid and air in the acid pickling process of the polycrystalline silicon materials can be effectively solved, and thecleaning quality and the cleaning effect can be ensured.

Description

technical field [0001] The invention belongs to the field of solar energy, and in particular relates to a polysilicon cleaning machine and a method for cleaning polysilicon. Background technique [0002] In the existing polysilicon cleaning process, the surface-contaminated polysilicon block is mainly soaked in a mixed solution of nitric acid and hydrofluoric acid, and the surface of the polysilicon is detached from the surface of the polysilicon by the chemical reaction between the acid and the surface of the polysilicon. , so as to improve the surface purity of polysilicon, and provide high-quality raw materials for later ingot casting or single crystal processes. Polysilicon automatic cleaning equipment is a new technology widely used in the field of solar energy in recent years. At present, the existing process technology mainly improves the sealing of the main body of the equipment to improve the sealing performance of the equipment itself, but it cannot prevent the ent...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08B08B13/00C30B33/10C30B29/06
CPCB08B3/08B08B13/00C30B33/10C30B29/06
Inventor 陈辉曲宏波刘应全张潼蔡爱梅张征张邦洁
Owner CHINA SILICON CORP LTD
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