Wafer heater surface temperature distribution detection device

Abstract

The invention discloses a wafer heater surface temperature distribution detection device which comprises a bottom wafer, an upper wafer, a miniature thermocouple, a kovar alloy bracket, a vacuum electrode and a temperature monitoring device. The miniature thermocouple is arranged between the bottom wafer and the upper wafer, the bottom wafer and the upper wafer are arranged on the kovar alloy bracket, the signal line of the miniature thermocouple is fixed through the kovar alloy bracket, and the miniature thermocouple is connected with the temperature detection device through the vacuum electrode. According to the wafer heater surface temperature distribution detection device, the double-layer wafer, the internal reinforcing bracket and the temperature measuring points are adopted for accurate processing, the detection device is not liable to break during use because of arrangement of the reinforcing bracket, the thermocouple temperature measuring head with a double-layer wafer structure is not liable to fall off, vacuum and atmosphere can be isolated by using the vacuum electrode, the thermocouple signal line is led to the atmosphere side through the vacuum electrode, and the surface temperature distribution condition of the wafer heater is recorded through the temperature monitoring device.

Description

technical field [0001] The invention belongs to the field of semiconductors, in particular to a device for detecting the surface temperature distribution of a wafer heater. Background technique [0002] Wafer heater is a key component in the production process of semiconductor manufacturing equipment. Semiconductor wafer manufacturing in integrated circuit technology needs to ensure uniform and stable temperature at different process temperatures. The uniformity and consistency of the temperature of the wafer heater The requirements are high, and the temperature uniformity test must be carried out during the production of the wafer heater. Only by rejecting unqualified products can the stable performance of the wafer heater be guaranteed. There are two commonly used detection methods at present: (1) thermal imaging The advantage of detection is that it is easy to use, but the disadvantage is that it is easily interfered by light, the detection error is large, and the tempera...

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Problems solved by technology

[0002] Wafer heater is a key component in the production process of semiconductor manufacturing equipment. Semiconductor wafer manufacturing in integrated circuit technology needs to ensure uniform and stable temperature at different process temperatures. The uniformity and consistency of the temperature of the wafer heater The requirements are high, and the temperature uniformity test must be carried out during the production of the wafer heater. Only by rejecting unqualified products can the stable performance of the wafer heater be guaranteed. There are two commonly used detection methods at present: (1) thermal imaging The advantage of detection is that it is easy to use, but the disadvantage is that it is easily interfered by light, the detection error is large, and the temperature on the wafer cannot be accurate; (2) Drill holes on the wafer, use adhesive to fix the thermocouple, and perform temperature detection. The temperature measurement is accurate, but the disadvantage is that it is expensive, the temperature measurement thermocouple is easy to fall off, the thin film signal line is easy to break, and the single wafer is easy to break when used

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