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Method for longitudinal processing using anti-spherical-aberration correction and application

A spherical aberration and longitudinal technology, applied in the field of micro-optical element processing, can solve the problems of unfavorable device miniaturization, long processing time, grating interlacing, etc., and achieve the goal of improving processing efficiency and structural quality, improving processing resolution, and increasing processing depth Effect

Active Publication Date: 2020-06-02
JILIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the former takes a long time to process, and the superimposed grating is prone to interlacing, which reduces the quality of the optical diffraction element
The latter, due to the reduced numerical aperture, leads to low processing resolution, which is not conducive to the miniaturization of devices

Method used

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  • Method for longitudinal processing using anti-spherical-aberration correction and application
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  • Method for longitudinal processing using anti-spherical-aberration correction and application

Examples

Experimental program
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Effect test

Embodiment 1

[0030] Obtain a stretched focal spot inside the material to be processed using inverse spherical aberration correction.

[0031] According to the Booth formula, the femtosecond laser focus focused inside the material to be processed is phase modulated, that is, the phase compensation factor s is expanded from the original single value to the interval [s-f st / 2, s+f st / 2], so that the focal spot is significantly stretched in the longitudinal direction, so as to obtain a linear focal spot that can be processed longitudinally with a large aspect ratio.

[0032] Using inverse spherical aberration correction to obtain stretched focal spots inside the material to be processed, the specific steps are as follows:

[0033] (1) Expand the compensation factor s to obtain aberration-corrected phase-compensated hologram: First, introduce the stretching factor f for the Booth formula st , so that the value of the compensation factor s is in [s-f st / 2, s+f st / 2], that is, to expand t...

Embodiment 2

[0040] Fabrication of nano-grating structures with large aspect ratio by using stretched focal spot.

[0041] When the repetition frequency of the femtosecond laser is high, continuous lines or surfaces can be obtained by point-by-point scanning. Use the femtosecond laser focused inside the material to be processed to stretch the focal spot, and scan point by point along the Z-axis direction (set the section where the stretched focal spot is located as the X-Y plane), and obtain a nano-grating structure arranged along the X-Y plane (i.e. a series of equally spaced nanofacets perpendicular to the X-Y plane).

[0042] Using the stretched focal spot to process a nano-grating structure with a large aspect ratio, the specific steps are as follows:

[0043] (1), expand the compensation factor s to obtain the phase compensation hologram of aberration correction: same as embodiment 1, where f is used st The value is 20, corresponding to the expansion interval of s is [s-10, s+10]. ...

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Abstract

The invention discloses a method for longitudinal processing using anti-spherical-aberration correction and application, and belongs to the technical field of femtosecond laser processing. The methodfor longitudinal processing using anti-spherical-aberration correction comprises the steps that anti-spherical-aberration correction is carried out on a femtosecond laser focus through a spatial lightmodulator, and a focal spot significantly stretching in the longitudinal direction is obtained from the deeper part of inside of a material to be processed, so that the stretched focal spot is directly used for continuously scanning inside of the material to be processed to achieve longitudinal processing with a large ratio of pit-depth to pit-diameter. Anti-spherical-aberration correction is used for obtaining the linear focal spot stretching significantly in the longitudinal direction, a longitudinal structure with a large ratio of pit-depth to pit-diameter can be processed inside the material at one time without requiring more than once processing to accumulate the longitudinal depth of the structure, structure staggering caused by more than once processing is avoided, the processing efficiency and structural quality are improved, the situation that the numerical aperture NA is reduced to increase the processing depth is not required, and the processing resolution is improved.

Description

technical field [0001] The invention belongs to the technical field of femtosecond laser processing, and in particular relates to longitudinally stretching a femtosecond laser focus by using inverse spherical aberration correction, so as to realize high-precision, longitudinally uniform micro-optical element processing. Background technique [0002] Micro-optical components are the basic components of micro-nanophotonics, and have important applications in optical chips and low-light therapy. Femtosecond laser processing technology has become one of the main technologies for processing micro-optical devices due to its high processing accuracy, high patterning level and effective modification of materials. Taking quartz materials as an example, femtosecond lasers can induce nano-grating structures inside them at high power, and at the same time, their high pulse energy can significantly change the refractive index of the induced region (up to 10 -3 order of magnitude), so as...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/55B23K26/082B23K26/06
CPCB23K26/0613B23K26/082B23K26/55
Inventor 孙洪波樊华陈岐岱
Owner JILIN UNIV
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