Display substrate, preparation method thereof and display device

Abstract

The embodiment of the invention provides a display substrate, a preparation method thereof and a display device, relates to the technical field of display, and can improve the problem that the characteristics of a thin film transistor are influenced by illumination. The display substrate comprises a substrate, a buffer layer and a thin film transistor, wherein the buffer layer and the thin film transistor are sequentially arranged on the substrate; wherein the thin film transistor comprises an active layer, a gate insulating layer and a gate which are sequentially stacked on a substrate; wherein the active layer extends along a first direction; wherein the active layer comprises a channel region, and the orthographic projection of the gate on the substrate is a gate region; wherein the edge of the gate region exceeds the edge of the channel region along a second direction vertical to the first direction; wherein the first direction and the second direction are perpendicular to the thickness direction of the substrate; a first groove is formed in the surface, deviating from the substrate, of the buffer layer in the region, exceeding the channel region, of the gate region.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a display substrate, a preparation method thereof, and a display device. Background technique [0002] With the development of display technology, large-size 8K displays will be one of the products that will be developed and researched in the future. [0003] Due to the further improvement of the integration level of the panel, each film layer of the backplane will be arranged into a regular microstructure. On the one hand, this microstructure will scatter ambient light, and part of the scattered light will scatter from the sub-pixel area of ​​the display area to the non-sub-pixel area of ​​the display area, thereby irradiating the active layer of the thin film transistor; on the other hand, each The refractive index of the film layer is different, and part of the ambient light may also be refracted from the sub-pixel area of ​​the display area to the non-sub-pixel area of ​​th...

AI Technical Summary

Problems solved by technology

[0004] After the active layer is exposed to light, it will affect the characteristics of the thin film transistor.

Especially for the driving transistor in the pixel circuit, under the action of light, the threshold voltage of the driving transistor will drift, which will cause the display panel to produce low grayscale brightness.

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